GeS (Germanium Sulfide) Sputtering Targets

  • Semiconducting properties: GeS is a semiconductor with excellent electrical conductivity, ideal for use in electronic and optoelectronic applications.
  • Optical performance: The material exhibits specific optical properties that make it suitable for optoelectronic and sensor devices.
  • High purity: GeS sputtering targets are available in high purity for optimal thin film quality.
  • Customizable: Can be tailored for various applications, with flexibility in composition, size, and target specifications.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Germanium Sulfide (GeS)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Germanium Sulfide (GeS) sputtering targets are made from a compound of Germanium (Ge) and Sulfur (S). These targets are used in the deposition of thin films with specific properties, including semiconducting and optical characteristics. GeS is utilized in various applications such as optoelectronics, sensors, and photovoltaic devices, where it can be used to create materials with desirable electrical and optical behaviors.

Key Applications

  • Semiconductor devices: GeS thin films are used in the fabrication of electronic devices that require specific semiconducting properties.
  • Optoelectronics: Used in optical devices such as light-emitting diodes (LEDs) and photodetectors.
  • Photovoltaic cells: GeS thin films are explored for use in solar cell applications for efficient light absorption and energy conversion.
  • Sensors: Employed in gas and chemical sensing applications due to their sensitivity to specific gases.

Features and Benefits

  • Semiconducting properties: GeS is a semiconductor with excellent electrical conductivity, ideal for use in electronic and optoelectronic applications.
  • Optical performance: The material exhibits specific optical properties that make it suitable for optoelectronic and sensor devices.
  • High purity: GeS sputtering targets are available in high purity for optimal thin film quality.
  • Customizable: Can be tailored for various applications, with flexibility in composition, size, and target specifications.

Specifications

  • Composition: GeS (Germanium and Sulfur)
  • Purity: Typically 99.99% or higher, ensuring minimal impurity levels for enhanced material performance.
  • Target Form: Available in circular, rectangular, and other custom shapes, with sizes ranging from 2 inches to 8 inches in diameter or custom dimensions.
  • Density: High-density sputtering targets designed for superior deposition performance.
  • Application Methods: Ideal for DC and RF sputtering processes.

Customization Options

  • Custom compositions: Tailored compositions of GeS to meet specific application requirements.
  • Size and thickness: Customizable target sizes and thicknesses to suit particular deposition processes.
  • Coatings: GeS sputtering targets can be supplied with special coatings, depending on the needs of the application.

For more information about GeS sputtering targets, including pricing, specifications, or to discuss a custom order, please contact us. Our team is ready to help you select the right GeS sputtering target for your application.