GZO (Gallium-doped Zinc Oxide) Sputtering Targets
- Transparent Conductivity: GZO has a high optical transparency in the visible range while maintaining excellent electrical conductivity.
- High Carrier Mobility: Gallium doping improves the carrier mobility in the Zinc Oxide structure, leading to enhanced performance in electrical applications.
- Low Resistivity: The addition of Gallium significantly reduces the resistivity of the material, making it suitable for transparent electrodes.
- Durability: GZO sputtering targets provide long-lasting performance in deposition processes, ensuring high-quality thin films with uniform characteristics.
- Versatility: Suitable for both DC and RF sputtering techniques, making them versatile for different deposition equipment.
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Description
| Material | Gallium-doped Zinc Oxide (GZO) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Gallium-doped Zinc Oxide (GZO) sputtering targets are a compound of Zinc Oxide (ZnO) with a small amount of Gallium (Ga) incorporated into its crystal structure. This combination enhances the electrical and optical properties of the material. GZO is commonly used for transparent conductive films in various electronic and optoelectronic applications, offering high electrical conductivity and transparency in the visible spectrum.
Key Applications
- Transparent Conductive Films (TCFs): GZO is widely used in the production of transparent conductive films for applications in touch screens, displays, and solar cells.
- Optoelectronics: Used in devices such as LEDs, lasers, and photodetectors, where high transparency and electrical conductivity are required.
- Solar Cells: GZO films are used in thin-film solar cells, where they function as a transparent electrode material.
- Flat-panel Displays: GZO targets are utilized in the manufacturing of flat-panel displays for consumer electronics, providing transparent conductive layers.
Features and Benefits
- Transparent Conductivity: GZO has a high optical transparency in the visible range while maintaining excellent electrical conductivity.
- High Carrier Mobility: Gallium doping improves the carrier mobility in the Zinc Oxide structure, leading to enhanced performance in electrical applications.
- Low Resistivity: The addition of Gallium significantly reduces the resistivity of the material, making it suitable for transparent electrodes.
- Durability: GZO sputtering targets provide long-lasting performance in deposition processes, ensuring high-quality thin films with uniform characteristics.
- Versatility: Suitable for both DC and RF sputtering techniques, making them versatile for different deposition equipment.
Specifications
- Composition: Gallium-doped Zinc Oxide (GZO)
- Purity: Typically 99.99% or higher, ensuring high-quality deposition with minimal contamination.
- Target Form: Available in various shapes and sizes, including circular targets ranging from 2 to 8 inches in diameter or customized dimensions.
- Density: High-density sputtering targets for superior deposition efficiency and uniformity.
- Deposition Methods: Ideal for DC and RF sputtering processes in high-performance thin-film applications.
Customization Options
- Gallium concentration: The Ga concentration can be customized according to the specific electrical and optical properties required.
- Size and Thickness: Custom sizes and thicknesses to meet specific sputtering system needs.
- Coatings: GZO targets can be supplied with different surface treatments or coatings to optimize performance in various applications.
For more information about Gallium-doped Zinc Oxide (GZO) sputtering targets, or to request custom specifications, please contact us. Our team of experts is ready to assist you in selecting the ideal target for your application.
