HfB2 (Hafnium Diboride) Sputtering Targets

  • High Purity: Ensures reliable deposition results with minimal impurities.
  • Thermal Resistance: Outstanding stability under extreme temperatures.
  • High Hardness: Provides superior durability for wear-resistant coatings.
  • Electrical Conductivity: Suitable for conductive thin-film applications.
  • Custom Configurations: Flexible options to meet specific deposition requirements.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Hafnium Diboride (HfB₂)
Purity 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Hafnium Diboride (HfB₂) sputtering targets are high-performance materials featuring exceptional hardness, high thermal stability, and excellent electrical conductivity. These targets are ideal for thin-film deposition processes in advanced electronic, aerospace, and protective coating applications, delivering superior material properties for demanding environments.

Key Applications

  • Aerospace Industry: High-temperature coatings for turbine blades and components.
  • Protective Coatings: Durable films with excellent wear and corrosion resistance.
  • Electronics: Thin films for microelectronics and semiconductors.
  • Research and Development: Exploration of advanced ceramic and conductive materials.

Features and Benefits

  • High Purity: Ensures reliable deposition results with minimal impurities.
  • Thermal Resistance: Outstanding stability under extreme temperatures.
  • High Hardness: Provides superior durability for wear-resistant coatings.
  • Electrical Conductivity: Suitable for conductive thin-film applications.
  • Custom Configurations: Flexible options to meet specific deposition requirements.

Specifications

  • Purity: ≥ 99.5% (higher purities available upon request).
  • Density: Optimized for uniform sputtering performance.
  • Dimensions: Standard and custom sizes available.
  • Structure: Hexagonal crystalline phase for consistent material properties.
  • Surface Finish: Precision-polished for optimal thin-film deposition.

Customization Options

  • Size and Shape: Custom dimensions to fit various sputtering systems.
  • Bonding Services: Backing plate options for better heat dissipation.
  • Composition Adjustments: Tailored material formulations on demand.
  • Purity Levels: Adjustable purity levels for specific applications.

Enhance your thin-film deposition processes with premium Hafnium Diboride (HfB₂) sputtering targets. Contact us for high-quality materials, expert solutions, and customizable configurations tailored to your project requirements.