HfN (Hafnium Nitride) Sputtering Targets

  • High Hardness: Produces durable and wear-resistant films.
  • Thermal Stability: Withstands high temperatures in extreme environments.
  • Corrosion Resistance: Ideal for chemically aggressive applications.
  • Electrical Conductivity: Offers low resistivity for electronic applications.
  • Customizable Properties: Tailored compositions and sizes to meet specific needs.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Hafnium Nitride (HfN)
Purity 99.5% – 99.999% / 2N5 3N 3N5 4N 4N5 5N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Hafnium Nitride (HfN) sputtering targets are high-performance materials used for creating hard, durable, and chemically resistant thin films. With excellent thermal and electrical conductivity, HfN is ideal for various advanced applications, including microelectronics, protective coatings, and decorative finishes. Its ability to form dense, adherent films makes it suitable for demanding environments.

Key Applications

  • Microelectronics: Employed in semiconductors and thin-film resistors for enhanced electrical performance.
  • Hard Coatings: Used for wear-resistant layers in tools and machinery.
  • Optical Coatings: Provides reflective and durable coatings for optical components.
  • Decorative Coatings: Adds an aesthetically appealing, corrosion-resistant finish to consumer products.
  • Aerospace and Defense: Suitable for high-temperature and erosion-resistant applications.

Features and Benefits

  • High Hardness: Produces durable and wear-resistant films.
  • Thermal Stability: Withstands high temperatures in extreme environments.
  • Corrosion Resistance: Ideal for chemically aggressive applications.
  • Electrical Conductivity: Offers low resistivity for electronic applications.
  • Customizable Properties: Tailored compositions and sizes to meet specific needs.

Specifications

  • Purity: ≥ 99.5% for reliable thin-film quality.
  • Density: Optimized for uniform sputtering performance.
  • Shape: Available in discs, plates, and custom geometries.
  • Dimensions: Manufactured to suit various sputtering systems.

Customization Options

  • Shape and Size: Custom geometries to meet application requirements.
  • Backing Plates: Available for improved thermal management and durability.
  • Compositional Adjustments: Tailored stoichiometry for specific film properties.

Our team of experts is ready to assist with your thin-film coating needs. Contact us to learn more about HfN sputtering targets, including pricing, specifications, and customization options.