HfO2 (Hafnium Oxide) Pellets Granules Evaporation Materials

Description

Material	HfO2
Purity	99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape	Pellets / Granules / Particles / Pieces
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
Supply Ability	1000kg per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

 

HfO₂ (Hafnium Oxide) pellets are high-purity materials used in thin-film deposition processes, especially via evaporation techniques such as physical vapor deposition (PVD) and electron-beam evaporation. Hafnium oxide is valued for its high dielectric constant, excellent thermal stability, and wide bandgap, making it ideal for a variety of advanced electronic and optical applications.

Key Applications:

• Semiconductors: HfO₂ is widely used as a high-k dielectric material in MOSFETs, enabling the miniaturization of electronic devices and improving their performance.
• Optical Coatings: HfO₂ is applied in thin films for optical coatings in UV, visible, and near-infrared (NIR) wavelengths, providing high reflectivity and durability.
• Gate Dielectrics: In transistors, HfO₂ acts as an insulator in gate dielectrics, replacing traditional silicon dioxide (SiO₂) for better charge retention and reduced power consumption.
• High-Temperature Applications: Due to its thermal stability, HfO₂ films are used in high-temperature applications such as thermal barriers and protective coatings for components in aerospace and energy industries.
• Capacitors and Non-Volatile Memory Devices: HfO₂ is utilized in DRAM and non-volatile memory (NVM) technologies due to its stable dielectric properties.
• Laser Systems: Thin films of HfO₂ serve as anti-reflection and reflective coatings in high-power laser systems, improving performance and lifespan.

Features:

• High Dielectric Constant: HfO₂ has a high k-value (~25), making it an excellent insulator for semiconductor devices, improving their efficiency and scaling capabilities.
• Wide Bandgap (5.3 eV): The wide bandgap of HfO₂ allows it to be used in optical devices operating in a broad range of wavelengths, especially in UV and visible spectra.
• Thermal and Chemical Stability: Hafnium oxide exhibits exceptional resistance to heat and chemicals, making it suitable for use in harsh environments and high-temperature processes.
• Low Absorption in the UV and Visible Range: HfO₂ thin films provide excellent optical performance with minimal absorption in UV and visible wavelengths, making them ideal for optical coatings.
• High Refractive Index: HfO₂ has a high refractive index, beneficial for applications requiring optical coatings with high reflectivity or anti-reflection properties.

Specifications:

• Material: Hafnium Oxide (HfO₂)
• Purity: ≥ 99.9%
• Shape: Pellets
• Size: Typically 1-6 mm in diameter, custom sizes available
• Melting Point: 2758°C
• Density: 9.68 g/cm³
• Deposition Methods: Suitable for thermal evaporation and electron-beam evaporation
• Optical Range: Ultraviolet (UV), visible (VIS), and near-infrared (NIR)
• Applications: High-k dielectrics, optical coatings, semiconductors, laser systems, and high-temperature coatings

Tinsan Materials offers high-purity HfO₂ (Hafnium Oxide) pellets for high-k dielectrics, optical coatings, and high-temperature applications. Ideal for PVD and electron-beam evaporation processes.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.