IGZO (Indium Gallium Zinc Oxide) Ceramic Targets

Description

Material	In2O3+Ga2O3+ZnO
Purity	99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape	disc, plate, sheet, rod, customized
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
MOQ	1pcs
Supply Ability	10000pcs per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

Indium Gallium Zinc Oxide (IGZO) sputtering targets are widely used in thin-film transistor (TFT) technology due to their superior electrical properties, including high electron mobility and low power consumption. IGZO is a popular material in advanced display technologies, offering significant improvements in performance compared to traditional amorphous silicon (a-Si) materials.

Key Applications:

Display Technology: IGZO is predominantly used in the production of thin-film transistors (TFTs) for LCDs and OLEDs, providing better transparency and higher resolution in next-generation displays such as 4K and 8K displays.
Touch Panels: IGZO thin films are applied in touch panel sensors, enhancing sensitivity and performance due to their high conductivity and transparency.
Flexible Electronics: IGZO’s excellent mechanical properties and flexibility make it an ideal material for flexible and bendable displays, which are becoming increasingly popular in smartphones, wearables, and other consumer electronics.
Low-Power Devices: IGZO is known for its low leakage current and ability to operate with low power consumption, making it suitable for energy-efficient devices, especially in mobile and portable electronics.
Semiconductors: In semiconductor manufacturing, IGZO sputtering targets are used to deposit thin films with precise electronic properties, critical for producing transistors and other active components in electronic circuits.

Features of IGZO Sputtering Targets:

High Electron Mobility: IGZO offers much higher electron mobility than amorphous silicon, leading to faster switching speeds and improved performance in TFT-based devices.
Low Power Consumption: IGZO thin films help reduce power usage in displays and electronics, making them ideal for energy-efficient applications.
Transparency: IGZO is a transparent conductive oxide, which is essential for applications in display and touch panel technologies.
Thermal Stability: IGZO provides excellent thermal stability, ensuring reliable performance even under high temperatures during processing.
Scalability for High-Resolution Displays: Due to its high electron mobility, IGZO is well-suited for producing ultra-high-resolution displays (such as 4K and 8K) with faster refresh rates and greater detail.

Customization Options:

Dimensions: IGZO sputtering targets can be fabricated in various shapes and sizes (discs, plates, and custom geometries) to suit different deposition equipment and production requirements.
Purity Levels: High-purity IGZO targets (up to 99.999%) are available for use in high-performance electronics and display technologies.
Indium-Gallium-Zinc Ratio: The composition of indium, gallium, and zinc in IGZO can be adjusted to optimize the electrical and optical properties of the deposited films for specific applications.

IGZO sputtering targets from Tinsan Materials provide high electron mobility, low power consumption, and transparency for next-gen displays, touch panels, and flexible electronics. Custom sizes and compositions available for advanced thin-film deposition in TFT technology.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.