ITO (Indium Tin Oxide) Sputtering Target

Description

Material	In2O3+SnO2
Purity	99.9% – 99.99999% / 3N 3N5 4N 4N5 5N 5N5 6N 6N5 7N
Shape	disc, plate, sheet, rod, customized
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
MOQ	1pcs
Supply Ability	10000pcs per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

ITO (Indium Tin Oxide) sputtering targets are widely used in the deposition of transparent conductive oxide (TCO) films, which are essential in various applications like touchscreens, solar cells, flat-panel displays, and optoelectronics. ITO is a solid solution of indium oxide (In2O3) and tin oxide (SnO2), offering a unique combination of high optical transparency and excellent electrical conductivity.

Key Applications:

Touchscreens and Displays: ITO is the primary material for transparent electrodes in touchscreens, LCDs, OLED displays, and flat-panel displays, offering both conductivity and transparency.
Photovoltaics: ITO is applied in solar cells as a transparent conductive layer that allows light to pass through while providing electrical conductivity.
Smart Windows: ITO is used in electrochromic windows or smart windows to control light transmission while maintaining transparency.
Optoelectronic Devices: ITO films are used in various optoelectronic devices such as light-emitting diodes (LEDs) and laser diodes, contributing to energy efficiency and performance.
Thin-film Antennas: ITO films are also used in transparent antennas where minimal interference with visibility is critical, such as in automotive and aircraft applications.
EMI Shielding: ITO coatings offer excellent electromagnetic interference (EMI) shielding, especially for displays and electronic components requiring both visibility and EMI protection.

Features of ITO Sputtering Targets:

High Transparency and Conductivity: ITO offers a balance of excellent transparency in the visible spectrum and good electrical conductivity, making it a perfect material for applications requiring both.
Adjustable Stoichiometry: The ratio of In2O3 to SnO2 in ITO can be adjusted to optimize its electrical and optical properties for specific applications.
Thin-film Uniformity: ITO films are known for their uniform thickness and quality, essential for ensuring consistent performance across large-area coatings like touchscreens and solar panels.
Durability: ITO films are chemically stable and durable, providing long-term performance in various environmental conditions.
Custom Purity Levels: ITO sputtering targets are available in a variety of purities (up to 99.999%) to meet the stringent requirements of high-performance electronic and optical devices.

Customization Options:

Dimensions: ITO sputtering targets can be produced in various sizes and shapes, such as planar, rotary, or custom geometries, depending on the sputtering system’s specifications.
Purity: High-purity ITO targets (up to 99.999%) are available for applications that require the highest levels of film quality and performance.
Tin Oxide (SnO2) Content: The SnO2 content can be tailored, typically ranging from 5% to 10%, depending on the required balance between electrical conductivity and transparency.
Target Bonding: ITO targets can be bonded to backing plates to enhance heat dissipation during the sputtering process, ensuring efficient deposition and longer target life.

ITO (Indium Tin Oxide) sputtering targets from Tinsan Materials offer high purity and customizable sizes for transparent conductive oxide films in touchscreens, displays, solar cells, and optoelectronics. Optimal for high-quality thin-film deposition.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.