IWO (Indium Tungsten Oxide) Sputtering Targets
- High Optical Transparency: Enables the creation of efficient transparent films.
- Superior Conductivity: Provides excellent electrical performance for electronic applications.
- Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
- Customizable Material Composition: Optimized for specific TCO requirements.
- Compatibility: Suitable for RF and DC sputtering systems.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Indium Tungsten Oxide (IWO) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Indium Tungsten Oxide (IWO) sputtering targets are high-performance materials designed for thin-film deposition in advanced optoelectronic and semiconductor applications. Combining excellent electrical conductivity, optical transparency, and thermal stability, IWO targets are ideal for producing transparent conductive oxide (TCO) layers, photovoltaic devices, and display technologies.
Key Applications
- Transparent Conductive Films: For displays, touch panels, and smart windows.
- Photovoltaics: Thin-film solar cells and other renewable energy applications.
- Semiconductors: Transparent conductive layers for electronic devices.
- Optoelectronics: Coatings for advanced photonic devices and sensors.
Features and Benefits
- High Optical Transparency: Enables the creation of efficient transparent films.
- Superior Conductivity: Provides excellent electrical performance for electronic applications.
- Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
- Customizable Material Composition: Optimized for specific TCO requirements.
- Compatibility: Suitable for RF and DC sputtering systems.
Specifications
- Chemical Formula: Indium Tungsten Oxide (In₂O₃-WO₃ composite).
- Purity: ≥ 99.9% (custom purities available).
- Density: ~7.2 g/cm³
- Target Shapes: Round, rectangular, and custom geometries.
- Dimensions: Tailored to sputtering system specifications.
Customization Options
- Material Composition: Adjustable In:W ratios to meet application requirements.
- Dimensions and Shapes: Custom sizes to fit specific sputtering setups.
- Bonding Services: Backing plates available for enhanced performance and durability.
- Purity Levels: High-purity materials to minimize impurities in thin films.
Advance your optoelectronic and semiconductor projects with premium Indium Tungsten Oxide (IWO) sputtering targets. Reach out to our team for expert advice and custom solutions tailored to your specific needs.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
