La2O3 (Lanthanum Oxide) Sputtering Target
- High Dielectric Constant: La₂O₃ exhibits a high dielectric constant, making it an excellent material for advanced electronic components, such as gate dielectrics in MOSFETs.
- High Refractive Index: Its high refractive index makes it ideal for enhancing optical properties in coatings for lenses, filters, and other precision optical devices.
- Thermal and Chemical Stability: La₂O₃ is highly stable under extreme temperatures and chemically resistant, making it suitable for high-performance applications.
- Catalytic Efficiency: Lanthanum oxide’s catalytic properties are leveraged in thin films used for environmental and energy applications.
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Description
| Material | La2O3 |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
La₂O₃ (Lanthanum Oxide) sputtering targets are used in various advanced material applications, especially in electronic devices, optics, and high-performance coatings. Lanthanum oxide is a rare earth oxide with excellent dielectric properties, high refractive index, and catalytic potential, making it valuable for the development of electronic components and optical coatings.
Key Applications:
- Semiconductor Industry: La₂O₃ is employed as a high-κ dielectric material in semiconductor devices like transistors to improve performance and energy efficiency.
- Optical Coatings: Thin films of La₂O₃ are used in optical applications due to its high refractive index, providing enhanced optical performance in lenses, filters, and mirrors.
- Catalysis: La₂O₃ sputtering targets are also utilized in the production of thin films for catalytic applications, particularly in automotive exhaust systems and hydrogen production.
- Ceramic Capacitors: Lanthanum oxide is an essential material in producing ceramic capacitors, where its high dielectric constant improves charge storage capacity.
Features of La₂O₃ Sputtering Targets:
- High Dielectric Constant: La₂O₃ exhibits a high dielectric constant, making it an excellent material for advanced electronic components, such as gate dielectrics in MOSFETs.
- High Refractive Index: Its high refractive index makes it ideal for enhancing optical properties in coatings for lenses, filters, and other precision optical devices.
- Thermal and Chemical Stability: La₂O₃ is highly stable under extreme temperatures and chemically resistant, making it suitable for high-performance applications.
- Catalytic Efficiency: Lanthanum oxide’s catalytic properties are leveraged in thin films used for environmental and energy applications.
Customization Options:
- Target Sizes and Shapes: La₂O₃ sputtering targets are available in a variety of sizes and shapes, tailored to fit different deposition systems.
- Purity Levels: High-purity La₂O₃ targets are available to ensure superior film quality for demanding applications in the semiconductor and optics industries.
- Bonding Services: Bonding options are available to improve thermal conductivity and stability during the sputtering process.
La₂O₃ (Lanthanum Oxide) sputtering targets from Tinsan Materials are ideal for semiconductor devices, optical coatings, and catalytic applications. High-κ dielectric material with excellent stability, available in custom sizes and high-purity options. Perfect for thin-film production in advanced electronic and optical systems.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
