La Lanthanum Sputtering Target

Description

Material	Lanthanum (La)
Purity	99.9% – 99.999% / 3N 3N5 4N 4N5 5N
Shape	disc, plate, sheet, rod, customized
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
MOQ	1pcs
Supply Ability	1000pcs per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

Lanthanum (La) sputtering targets are crucial for creating thin films with specific electronic, optical, and catalytic properties, making them valuable in advanced technologies such as semiconductors, optics, superconductors, and energy storage systems. Despite its reactivity, lanthanum’s unique characteristics provide significant advantages in various high-tech industrial and scientific applications.

Key Features:

Purity: Lanthanum sputtering targets are typically offered in high purity levels, such as 99.9% (3N) or higher, to ensure the production of high-quality, consistent thin films.
Shapes and Sizes: These targets are available in various forms, including discs, plates, and custom shapes, to fit different sputtering systems and meet specific application needs.

Applications:

Catalysts: Lanthanum is used in catalytic converters and other catalyst applications, especially in the automotive industry. Lanthanum-based thin films can be deposited onto substrates to enhance catalytic performance in chemical reactions.
Optical Materials: Lanthanum is a key component in the production of optical glasses and lenses, such as Lanthanum-doped glass, which improves refractive index and light transmission. These materials are used in high-quality camera lenses, microscopes, and other optical devices.
Semiconductors: Lanthanum is used in semiconductor devices, particularly in the fabrication of high-k dielectric materials in advanced transistors and integrated circuits. Lanthanum oxide (La2O3) thin films are essential for enhancing the performance of semiconductor components by improving electrical insulation and reducing power consumption.
Energy Storage: Lanthanum is used in nickel-metal hydride (NiMH) batteries, where it plays a role in improving energy density and charge/discharge efficiency. Thin films of lanthanum or its alloys can be used in advanced battery technologies.
Superconductors: Lanthanum is used in the production of high-temperature superconductors, such as lanthanum-barium-copper-oxide (LaBaCuO). These materials are crucial in applications requiring zero electrical resistance, such as in magnetic levitation, MRI machines, and other advanced electronic devices.
Ceramics: Lanthanum oxide is used to manufacture advanced ceramics with high thermal stability, mechanical strength, and resistance to chemical corrosion. These ceramics are used in aerospace, defense, and high-temperature applications.

Customization Options:

Thickness: The thickness of the lanthanum coating can be precisely controlled during the sputtering process, allowing for tailored solutions to meet specific application needs.
Alloys: Lanthanum sputtering targets can be produced as pure lanthanum or in alloyed forms, such as lanthanum-nickel (La-Ni) or lanthanum-aluminum (La-Al), depending on the desired properties of the thin film.
Backing Plates: Lanthanum targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.

Lanthanum (La) sputtering targets are utilized in physical vapor deposition (PVD) processes to create thin films of lanthanum on various substrates. Lanthanum is a rare earth element known for its high reactivity, unique electronic properties, and ability to form complex compounds, making it valuable in various advanced technology applications, especially in electronics, optics, and materials science.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.