LiF (Lithium Fluoride) Sputtering Target
- High Optical Transparency: LiF has high optical transparency in the UV, visible, and infrared regions, making it an excellent material for optical coatings and components.
- Wide Bandgap: LiF has a wide bandgap (~13.6 eV), which makes it an excellent insulating material in electronic and optoelectronic applications.
- Low Absorption: LiF thin films exhibit low absorption across a broad spectral range, making them ideal for applications where minimal light loss is required.
- Chemical Stability: LiF is chemically stable and resistant to moisture, which contributes to its durability in harsh environments and long-lasting performance in thin-film coatings.
- Insulating Properties: LiF has excellent insulating properties, which are beneficial for electronic and optoelectronic devices where electrical isolation is needed.
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Description
| Material | LiF |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Lithium fluoride (LiF) sputtering targets are commonly used for thin-film deposition in a variety of optical, electronic, and semiconductor applications. LiF is known for its excellent optical transparency, wide bandgap, and insulating properties, making it a valuable material for coatings, protective layers, and thin films.
Key Applications:
- Optical Coatings: LiF thin films are widely used in optical applications due to their high transparency across a wide spectral range, including the UV, visible, and infrared regions. LiF is particularly valued for use in antireflective coatings, UV optics, and high-performance optical devices.
- Semiconductor Devices: In semiconductor fabrication, LiF is utilized as an insulating material and for protective coatings. Its wide bandgap and low dielectric constant make it suitable for use in electronic components and thin-film transistors.
- X-ray and UV Windows: LiF is often used as a window material for X-ray and UV applications due to its high transparency to short-wavelength radiation. It is also used in X-ray optics and detectors.
- Thin-film Deposition: LiF sputtering targets are used to deposit thin films with insulating or transparent properties for a variety of electronic, optical, and protective applications. These thin films are valued for their low absorption and excellent chemical stability.
- Lithium-ion Batteries: Although less common than other lithium compounds, LiF can be used as a thin-film component in solid-state lithium-ion batteries, providing enhanced chemical stability and ion conductivity in some applications.
Features of LiF Sputtering Targets:
- High Optical Transparency: LiF has high optical transparency in the UV, visible, and infrared regions, making it an excellent material for optical coatings and components.
- Wide Bandgap: LiF has a wide bandgap (~13.6 eV), which makes it an excellent insulating material in electronic and optoelectronic applications.
- Low Absorption: LiF thin films exhibit low absorption across a broad spectral range, making them ideal for applications where minimal light loss is required.
- Chemical Stability: LiF is chemically stable and resistant to moisture, which contributes to its durability in harsh environments and long-lasting performance in thin-film coatings.
- Insulating Properties: LiF has excellent insulating properties, which are beneficial for electronic and optoelectronic devices where electrical isolation is needed.
Customization Options:
- Target Sizes: LiF sputtering targets are available in various sizes and shapes, including planar and rotary designs, to suit different sputtering systems.
- Purity Levels: High-purity LiF targets (up to 99.99%) are offered to ensure high-quality thin-film deposition for critical applications.
- Doping: LiF sputtering targets can be customized with doping options to enhance specific properties of the thin films, such as electrical conductivity or optical performance.
LiF (Lithium Fluoride) sputtering targets from Tinsan Materials are used in optical coatings, semiconductor devices, and X-ray windows. High-purity, customizable LiF targets for thin-film deposition in electronics and optoelectronics.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
