Mn Manganese Sputtering Target
Manganese (Mn) sputtering targets are essential for industries that rely on magnetic properties, wear resistance, and corrosion resistance, making them indispensable in electronics, magnetic storage, metallurgy, and catalytic applications.
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Description
| Material | Manganese (Mn) |
| Purity | 99.9% – 99.999% / 3N 3N5 4N 4N5 5N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 1000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Manganese (Mn) sputtering targets are essential for industries that rely on magnetic properties, wear resistance, and corrosion resistance, making them indispensable in electronics, magnetic storage, metallurgy, and catalytic applications.
Key Features:
- Purity: Manganese sputtering targets are typically available in high purity levels, such as 99.9% (3N) or higher, to ensure the deposition of high-quality and consistent films.
- Shapes and Sizes: These targets are available in various forms, including discs, plates, and custom shapes, to suit different sputtering systems and specific application requirements.
Applications:
- Magnetic Storage: Manganese is often used in the production of magnetic storage devices, such as hard disk drives, where it can be alloyed with other metals like iron (FeMn) to enhance magnetic properties.
- Electronics: Manganese films are used in semiconductor devices and thin-film transistors, contributing to the performance and durability of electronic components.
- Alloys: Manganese is a key element in the production of various alloys, such as manganese-steel (Hadfield steel), which are used for their wear resistance and high impact strength.
- Corrosion Resistance: Manganese coatings can be applied to improve the corrosion resistance of metals, especially in harsh environments, making them valuable in marine and industrial applications.
- Catalysis: Manganese-based films are also used in catalytic applications, where they enhance the efficiency of chemical reactions, particularly in environmental and energy-related technologies.
Customization Options:
- Thickness: The thickness of the manganese coating can be precisely controlled during the sputtering process, allowing for tailored solutions to meet specific application needs.
- Alloys: Manganese sputtering targets can be produced as pure manganese or in alloyed forms, such as manganese-nickel (Mn-Ni) or manganese-copper (Mn-Cu), depending on the desired properties of the thin film.
- Backing Plates: Manganese targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.
Manganese sputtering targets are specialized materials used in physical vapor deposition (PVD) processes to deposit thin manganese films onto various substrates. Manganese is known for its unique magnetic properties, high hardness, and ability to form alloys, making it valuable in a variety of applications, particularly in electronics, magnetic storage, and metallurgy.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
