MoO2 (Molybdenum Dioxide) Sputtering Targets

  • High Purity: Guarantees superior film quality and reduces impurities.
  • Excellent Conductivity: Suitable for applications requiring conductive thin films.
  • Thermal Stability: Performs reliably in high-temperature environments.
  • Customizable Specifications: Tailored to specific sputtering system requirements.
  • Versatility: Compatible with various sputtering techniques, including RF and DC.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Molybdenum Dioxide (MoO₂)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Molybdenum Dioxide (MoO₂) sputtering targets are advanced materials used in thin-film deposition processes for creating high-performance coatings. Known for their excellent electrical conductivity and catalytic properties, MoO₂ targets are ideal for applications in electronics, energy storage devices, and specialized coatings. These targets are manufactured with high purity and precision, ensuring optimal performance in both research and industrial applications.

Key Applications

  • Electronics: Thin films for semiconductors and conductive layers.
  • Energy Storage: Used in battery electrode materials for improved performance.
  • Catalysis: Coatings for enhancing catalytic reactions in chemical industries.
  • Research & Development: Thin-film studies and experimental applications.

Features and Benefits

  • High Purity: Guarantees superior film quality and reduces impurities.
  • Excellent Conductivity: Suitable for applications requiring conductive thin films.
  • Thermal Stability: Performs reliably in high-temperature environments.
  • Customizable Specifications: Tailored to specific sputtering system requirements.
  • Versatility: Compatible with various sputtering techniques, including RF and DC.

Specifications

  • Chemical Formula: Molybdenum Dioxide (MoO₂).
  • Purity: ≥ 99.9% (higher purities available upon request).
  • Density: ~6.47 g/cm³.
  • Target Shapes: Round, rectangular, or custom geometries.
  • Dimensions: Adjustable to meet diverse equipment needs.

Customization Options

  • Target Sizes and Shapes: Designed to fit specific sputtering systems.
  • Purity Levels: Ultra-high purity options for advanced applications.
  • Bonding Services: Backing plates for enhanced durability and thermal management.
  • Coating Options: Additional surface treatments upon request.

Enhance your thin-film deposition projects with high-quality Molybdenum Dioxide (MoO₂) sputtering targets. Contact us for customized solutions and expert support tailored to your application needs.