MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

MoO3 (Molybdenum Trioxide) Sputtering Target

  • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
  • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
  • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
  • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.

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Description

Material MoO3
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Molybdenum trioxide (MoO₃) sputtering targets are widely used in thin-film deposition for applications in electronics, catalysis, sensors, and energy storage. MoO₃ has unique electronic, optical, and catalytic properties that make it suitable for use in a variety of high-performance thin-film devices and functional coatings.

Key Applications:

  • Electronics and Optoelectronics: MoO₃ thin films are utilized in electronic and optoelectronic devices such as transistors, organic light-emitting diodes (OLEDs), and organic photovoltaics (OPVs). MoO₃ serves as an efficient hole transport layer and an interface material in these devices due to its high work function and transparent conductive properties.
  • Electrochromic Devices: MoO₃ is a widely studied material for use in electrochromic devices, such as smart windows and displays. Thin films of MoO₃ can change their optical properties in response to an applied voltage, allowing for dynamic control of light transmission.
  • Energy Storage: MoO₃ is being explored for its potential in energy storage devices like lithium-ion batteries and supercapacitors. MoO₃ thin films are known for their high energy density and ability to enhance the electrochemical performance of battery electrodes.
  • Catalysis: MoO₃ has strong catalytic properties, particularly in oxidation reactions. It is used in industrial catalysts for chemical reactions such as the production of formaldehyde and sulfur removal in petroleum refining.
  • Gas Sensors: MoO₃ thin films are employed in gas sensors due to their sensitivity to various gases, including ammonia (NH₃), nitrogen dioxide (NO₂), and hydrogen sulfide (H₂S). MoO₃-based sensors exhibit fast response times and good selectivity.

Features of MoO₃ Sputtering Targets:

  • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
  • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
  • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
  • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.

Customization Options:

  • Target Sizes: MoO₃ sputtering targets are available in various sizes and shapes, including planar and rotary designs, to meet different sputtering system requirements.
  • Purity Levels: High-purity MoO₃ targets (up to 99.99%) can be provided to ensure high-quality film deposition for critical applications.
  • Doping Options: MoO₃ sputtering targets can be doped with other materials to enhance or modify the electrical, optical, or catalytic properties of the thin films.

MoO₃ (Molybdenum Trioxide) sputtering targets from Tinsan Materials are used in electronics, energy storage, electrochromic devices, and catalysis. High-purity, customizable MoO₃ targets for thin-film deposition in a wide range of advanced applications.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.

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