NbN Niobium Nitride Sputtering Targets

Description

Material	Niobium Nitride (NbN)
Purity	99.9% – 99.999% / 3N 3N5 4N 4N5 5N
Shape	disc, plate, sheet, rod, customized
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
MOQ	1pcs
Supply Ability	10000pcs per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

 

NbN (Niobium Nitride) sputtering targets are high-performance ceramic materials composed of niobium and nitrogen. These targets offer a range of advantages in the deposition of high-quality thin films, including exceptional electrical conductivity, thermal stability, and chemical resistance. With their high purity and unique properties, NbN sputtering targets are widely utilized in advanced technology sectors such as superconducting materials, microelectronics, optical coatings, and hard coatings.

Niobium nitride is primarily used in Physical Vapor Deposition (PVD) processes to produce high-quality coatings on substrates, making it an ideal choice for industries demanding precise and durable thin films. NbN sputtering targets are known for their excellent adhesion properties and ability to deposit films that possess superior hardness, wear resistance, and electrical characteristics.

Key Applications

• Superconducting Films: NbN is a critical material in the fabrication of superconducting thin films, used extensively in quantum computing, magnetic sensors, and low-temperature applications. These films are employed in advanced electronics and cryogenic systems where superconductivity is a necessary property.
• Optical Coatings: NbN sputtering targets are commonly used for high-performance optical coatings, including anti-reflection coatings and mirrors. Their optical properties are particularly beneficial in the fabrication of optical filters, coatings for lenses, and mirrors with enhanced durability and performance.
• Microelectronics & Semiconductors: NbN films are used in microelectronics for creating barrier layers, diffusion barriers, and conductive films. Their excellent electrical conductivity and thermal stability make them suitable for advanced semiconductor manufacturing processes, including integrated circuits and thin-film transistors (TFTs).
• Hard Coatings: With outstanding hardness and wear resistance, NbN sputtering targets are employed to create durable coatings for tooling, machinery parts, and cutting tools. These coatings provide superior protection against wear, corrosion, and high temperatures, extending the lifespan of components in industrial applications.

Features

• High Purity: NbN sputtering targets are manufactured with purity levels of up to 99.999%, ensuring excellent film consistency and performance in various deposition applications.
• Electrical Conductivity: Known for its high electrical conductivity, NbN is used in applications requiring efficient electron flow and low resistance.
• Thermal Stability: Niobium nitride exhibits excellent thermal stability, maintaining performance even at elevated temperatures, making it suitable for high-temperature applications.
• Corrosion Resistance: NbN films exhibit outstanding resistance to oxidation and chemical wear, making them ideal for applications in harsh environments.
• Uniformity in Coating: NbN sputtering targets provide excellent film uniformity and density, ensuring reliable coating processes with minimal defects.
• Hardness: The resulting NbN films are known for their exceptional hardness, making them suitable for tough, abrasive conditions.

Specifications

• Material: Niobium Nitride (NbN)
• Purity: 99.9% or higher
• Density: 8.6 g/cm³
• Form: Available in various shapes and sizes, including discs, rings, and custom configurations
• Application: Superconducting films, optical coatings, microelectronics, hard coatings
• Deposition Method: PVD, sputtering
• Coating Thickness: Customizable depending on application requirements

Advantages

• High-Quality Films: NbN sputtering targets produce high-performance thin films with superior uniformity and consistency.
• Superior Film Properties: The films deposited from NbN targets exhibit excellent electrical conductivity, hardness, and resistance to wear and corrosion.
• Broad Application Range: NbN sputtering targets are versatile, serving a variety of industries such as electronics, optics, and materials science.
• Customizable: NbN sputtering targets are available in different sizes and configurations to meet specific customer requirements.
• Efficient Deposition: These targets offer a high deposition rate in sputtering processes, improving overall productivity and reducing manufacturing costs.

Industries Served

• Semiconductor Manufacturing
• Quantum Computing and Superconducting Electronics
• Optical Coatings and Thin Film Technology
• Aerospace and Defense
• Industrial Coating Applications

NbN sputtering targets provide a reliable solution for a wide range of applications that require high-quality, durable, and conductive thin films. Their ability to deliver excellent performance in both low and high-temperature environments makes them an essential material in advanced technologies. Whether used for semiconductor devices, optical coatings, or hard wear-resistant films, NbN sputtering targets contribute to the development of cutting-edge products and technologies.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.