NbSi2 (Niobium Disilicide) Sputtering Targets
- High Thermal Stability: Performs reliably in extreme temperatures.
- Oxidation Resistance: Ideal for protective coatings in harsh environments.
- Superior Mechanical Strength: Enhances the durability of deposited films.
- High Purity Standards: Ensures film quality and minimal contamination.
- Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Niobium Disilicide (NbSi₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Niobium Disilicide (NbSi₂) sputtering targets are advanced materials engineered for high-performance thin-film deposition. Known for their superior thermal stability, oxidation resistance, and excellent mechanical properties, NbSi₂ sputtering targets are widely utilized in semiconductor manufacturing, protective coatings, and aerospace applications. These targets ensure precise deposition processes, delivering consistent and high-quality thin films for a variety of cutting-edge technologies.
Key Applications
- Semiconductors: Thin films for microelectronic components and integrated circuits.
- Protective Coatings: Oxidation-resistant and high-temperature durable films.
- Aerospace and Automotive: Thermal and structural coatings for high-performance systems.
- Energy Systems: Materials for advanced photovoltaic and thermoelectric devices.
- R&D: Investigative studies in nanotechnology and material sciences.
Features and Benefits
- High Thermal Stability: Performs reliably in extreme temperatures.
- Oxidation Resistance: Ideal for protective coatings in harsh environments.
- Superior Mechanical Strength: Enhances the durability of deposited films.
- High Purity Standards: Ensures film quality and minimal contamination.
- Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
Specifications
- Chemical Formula: NbSi₂
- Purity: ≥ 99.5% (higher purities available upon request).
- Density: ~6.3 g/cm³
- Shapes: Circular, rectangular, and custom geometries.
- Sizes: Standard and customized dimensions for diverse sputtering systems.
Customization Options
- Geometry: Flexible shapes and sizes tailored for various deposition systems.
- Enhanced Purity: Ultra-high purity grades for specialized applications.
- Backing Plates: Optional integration for improved heat dissipation and structural support.
- Custom Compositions: Tailored formulations to suit specific application needs.
Optimize your thin-film deposition process with Niobium Disilicide (NbSi₂) sputtering targets. Contact us for expert guidance, custom options, and dependable solutions tailored to your precise requirements.
