Lead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials
Lead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

PZT (Lead Zirconate Titanate or Pb(Zr,Ti)O3) Sputtering Targets

  • High Piezoelectric Coefficient: Enables efficient conversion of mechanical energy to electrical energy and vice versa.
  • Stable Dielectric Properties: Ensures reliable performance in high-frequency applications.
  • Customizable Compositions: Tailored Zr/Ti ratios to meet specific functional requirements.
  • High Purity and Uniformity: Ensures consistent film deposition with minimal defects.
  • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.

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Description

Material Lead Zirconate Titanate (Pb(Zr,Ti)O₃ or PZT)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Lead Zirconate Titanate (Pb(Zr,Ti)O₃ or PZT) sputtering targets are advanced ceramic materials widely utilized in thin-film deposition processes for piezoelectric and ferroelectric applications. PZT offers exceptional dielectric and piezoelectric properties, making it a key material in sensors, actuators, transducers, and memory devices.

Key Applications

  • Piezoelectric Devices: Utilized in sensors, actuators, and ultrasonic transducers.
  • Ferroelectric Thin Films: Ideal for non-volatile memory applications such as FRAM.
  • Microelectromechanical Systems (MEMS): Found in devices requiring high precision and responsiveness.
  • Energy Harvesting: Used in piezoelectric energy generators.
  • Optoelectronic Applications: Suitable for integrated optical devices and modulators.

Features and Benefits

  • High Piezoelectric Coefficient: Enables efficient conversion of mechanical energy to electrical energy and vice versa.
  • Stable Dielectric Properties: Ensures reliable performance in high-frequency applications.
  • Customizable Compositions: Tailored Zr/Ti ratios to meet specific functional requirements.
  • High Purity and Uniformity: Ensures consistent film deposition with minimal defects.
  • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.

Specifications

  • Purity: ≥ 99.9% for superior thin-film quality.
  • Density: Optimized for efficient sputtering and uniform deposition.
  • Dimensions: Custom shapes and sizes available to suit various deposition systems.
  • Formulation: Tunable Zr/Ti ratios for targeted piezoelectric and dielectric properties.
  • Surface Finish: Smooth, polished surface for precise film deposition.

Customization Options

  • Zr/Ti Ratio Adjustment: Tailored compositions to optimize performance for specific applications.
  • Size and Shape Variability: Custom dimensions to match sputtering equipment.
  • Bonding Services: Backing plate options for enhanced thermal management.
  • Special Packaging: Secure and contamination-free packaging for safe transport and storage.

Looking for high-quality Lead Zirconate Titanate (PZT) sputtering targets? Contact us for customizable solutions, expert advice, and dependable delivery to support your thin-film deposition needs.

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