Rhodium (Rh) Sputtering Targets
- Excellent Reflectivity: Ideal for optical and decorative applications.
- High Corrosion Resistance: Suitable for harsh environments and chemical exposure.
- Superior Thermal Stability: Ensures performance under high temperatures.
- High Conductivity: Reliable for electronic applications.
- Customizable Configurations: Available in various sizes, purities, and bonding options.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Rhodium (Rh) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Rhodium (Rh) sputtering targets are premium materials known for their excellent reflectivity, corrosion resistance, and catalytic properties. These targets are widely used in advanced applications, including semiconductor fabrication, optical coatings, and decorative finishes. With high electrical conductivity and thermal stability, Rhodium targets ensure consistent performance in demanding thin-film deposition processes.
Key Applications
- Semiconductors: Deposition of thin films for electronic devices and circuits.
- Optical Coatings: Reflective coatings for mirrors, lenses, and optical instruments.
- Catalysis: Thin films for chemical reactions and fuel cell technologies.
- Decorative Coatings: High-luster and corrosion-resistant finishes for jewelry and luxury items.
- Aerospace & Automotive: Protective and functional layers for advanced systems.
Features and Benefits
- Excellent Reflectivity: Ideal for optical and decorative applications.
- High Corrosion Resistance: Suitable for harsh environments and chemical exposure.
- Superior Thermal Stability: Ensures performance under high temperatures.
- High Conductivity: Reliable for electronic applications.
- Customizable Configurations: Available in various sizes, purities, and bonding options.
Specifications
- Chemical Symbol: Rh
- Atomic Number: 45
- Purity: ≥ 99.9% (higher purities available upon request).
- Density: 12.41 g/cm³
- Melting Point: 1964 °C
- Shapes and Sizes: Round, rectangular, and custom dimensions.
Customization Options
- Sizes and Shapes: Tailored to fit specific sputtering equipment.
- Purity Levels: Adjustable to meet unique application requirements.
- Bonding Services: Backing plate options for improved thermal management.
- Special Configurations: Composite and alloy targets for unique thin-film properties.
Enhance your thin-film deposition processes with high-quality Rhodium (Rh) sputtering targets. Contact us today to explore customization options and receive expert guidance tailored to your application needs.
