Si2Te3 (Silicon Telluride) Sputtering Targets
- High Purity: Ensures minimal contamination and consistent deposition performance.
- Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
- Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
- Excellent Film Properties: Supports the production of uniform, high-quality thin films.
- Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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Description
| Material | Silicon Telluride (Si₂Te₃) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Silicon Telluride (Si₂Te₃) sputtering targets are advanced thin-film deposition materials widely used in semiconductors, optoelectronics, and photonics. These targets are composed of silicon and tellurium in a precise stoichiometric ratio, ensuring consistent film quality. Si₂Te₃ is known for its excellent electrical and thermal properties, making it ideal for fabricating phase-change memory materials, thermoelectric devices, and infrared optical coatings.
Key Applications
- Phase-Change Memory: Key material for non-volatile memory devices.
- Thermoelectric Devices: Utilized in energy harvesting and thermal management systems.
- Optoelectronics: Infrared detectors and modulators for advanced photonic applications.
- Thin-Film Transistors: High-performance coatings for semiconductor devices.
- Research and Development: A versatile material for innovation in materials science.
Features and Benefits
- High Purity: Ensures minimal contamination and consistent deposition performance.
- Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
- Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
- Excellent Film Properties: Supports the production of uniform, high-quality thin films.
- Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
Specifications
- Chemical Composition: Silicon (Si) and Tellurium (Te) in a 2:3 ratio.
- Purity: ≥ 99.5% (higher purity available upon request).
- Density: Specific to the Si₂Te₃ compound.
- Target Forms: Circular, rectangular, or custom geometries.
- Sizes: Standard and tailored dimensions available to meet system requirements.
Customization Options
- Tailored Composition: Adjustments to meet specialized application needs.
- Size and Shape: Customizable geometries for compatibility with various sputtering systems.
- Backing Plates: Optional bonding for enhanced thermal and mechanical performance.
- Purity Levels: Ultra-high purity versions for demanding applications.
Looking for high-quality Silicon Telluride (Si₂Te₃) sputtering targets? Contact us to explore our product range, discuss your specific needs, and receive expert guidance for your thin-film deposition projects.
