Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

Si3N4 (Silicon Nitride) Sputtering Target

  • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
  • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
  • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
  • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
  • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.

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Description

Material Si3N4
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Silicon Nitride (Si₃N₄) sputtering targets are widely used to deposit thin films for a range of high-performance applications, including semiconductor manufacturing, optics, protective coatings, and wear-resistant surfaces. Si₃N₄ films are known for their excellent mechanical strength, high thermal stability, chemical resistance, and insulating properties, making them valuable in environments where durability and performance are critical.

Key Applications:

  • Semiconductors: Si₃N₄ is used as a dielectric material in microelectronics, especially in metal-oxide-semiconductor (MOS) and complementary MOS (CMOS) devices. It serves as a passivation layer, protective coating, or insulating layer in integrated circuits (ICs).
  • Optical Coatings: Si₃N₄ thin films are used in optical coatings for anti-reflective and protective purposes due to their transparency in the visible and infrared regions.
  • Protective Coatings: Silicon Nitride films are applied as protective coatings for mechanical parts, tools, and components that require superior wear and corrosion resistance.
  • Hard Coatings: Si₃N₄ films provide excellent hardness and scratch resistance, often applied to cutting tools and machinery parts to improve durability and extend their service life.
  • Photovoltaic Cells: Si₃N₄ is used in the production of photovoltaic cells as an anti-reflection coating, enhancing light absorption and efficiency.

Features of Si₃N₄ Sputtering Targets:

  • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
  • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
  • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
  • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
  • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.

Customization Options:

  • Target Sizes: Si₃N₄ sputtering targets are available in various sizes and shapes, including circular, rectangular, and custom geometries, suitable for different sputtering systems.
  • Purity Levels: High-purity Si₃N₄ targets (up to 99.99%) are available to ensure superior film quality and performance in sensitive applications.
  • Bonding Services: Si₃N₄ targets can be bonded to backing plates to improve thermal conductivity during sputtering, preventing target cracking and ensuring uniform film deposition.

Si₃N₄ (Silicon Nitride) sputtering targets from Tinsan Materials are ideal for producing thin films with exceptional hardness, thermal stability, and chemical resistance. Suitable for semiconductors, optical coatings, and protective films, Si₃N₄ targets offer customizable sizes and high-purity options for precise deposition in high-performance applications.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.

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