SiC (Silicon Carbide) Sputtering Targets

  • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
  • High Thermal Stability: Performs well under extreme temperatures.
  • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
  • Chemical Resistance: Resilient to corrosive environments.
  • Customizable Configurations: Available in various sizes, purities, and bonding options.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Silicon Carbide (SiC)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Silicon Carbide (SiC) sputtering targets are highly durable materials known for their exceptional hardness, thermal stability, and wide-bandgap properties. These targets are widely used in semiconductor, electronic, and optical coating applications, ensuring reliable and high-performance thin-film deposition. With superior chemical and mechanical resistance, SiC targets are ideal for demanding environments.

Key Applications

  • Semiconductor Devices: Deposition of thin films for power electronics, MEMS, and high-frequency devices.
  • Optical Coatings: Anti-reflective and protective coatings for lenses, mirrors, and displays.
  • Protective Layers: Hard, wear-resistant coatings for tools and surfaces.
  • Photovoltaics: Functional films in solar panel technologies.
  • Research and Development: Advanced material studies and prototyping.

Features and Benefits

  • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
  • High Thermal Stability: Performs well under extreme temperatures.
  • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
  • Chemical Resistance: Resilient to corrosive environments.
  • Customizable Configurations: Available in various sizes, purities, and bonding options.

Specifications

  • Chemical Formula: SiC
  • Purity: ≥ 99.9% (custom purities available upon request).
  • Density: Optimized for consistent sputtering performance.
  • Dimensions: Customizable to fit different sputtering systems.
  • Surface Finish: Polished for uniform thin-film application.

Customization Options

  • Sizes and Shapes: Tailored to match specific deposition systems.
  • Purity Levels: Adjustable to meet precise application requirements.
  • Bonding Services: Backing plate options for enhanced thermal conductivity.
  • Special Formulations: Composite targets for unique material properties.

Unlock the potential of your thin-film deposition processes with high-quality Silicon Carbide (SiC) sputtering targets. Contact us today to discuss your requirements and explore our customized solutions.