SiC (Silicon Carbide) Sputtering Targets
- Exceptional Hardness: Ideal for durable, wear-resistant coatings.
- High Thermal Stability: Performs well under extreme temperatures.
- Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
- Chemical Resistance: Resilient to corrosive environments.
- Customizable Configurations: Available in various sizes, purities, and bonding options.
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Description
Material | Silicon Carbide (SiC) |
Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
Place of Origin | China |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Silicon Carbide (SiC) sputtering targets are highly durable materials known for their exceptional hardness, thermal stability, and wide-bandgap properties. These targets are widely used in semiconductor, electronic, and optical coating applications, ensuring reliable and high-performance thin-film deposition. With superior chemical and mechanical resistance, SiC targets are ideal for demanding environments.
Key Applications
- Semiconductor Devices: Deposition of thin films for power electronics, MEMS, and high-frequency devices.
- Optical Coatings: Anti-reflective and protective coatings for lenses, mirrors, and displays.
- Protective Layers: Hard, wear-resistant coatings for tools and surfaces.
- Photovoltaics: Functional films in solar panel technologies.
- Research and Development: Advanced material studies and prototyping.
Features and Benefits
- Exceptional Hardness: Ideal for durable, wear-resistant coatings.
- High Thermal Stability: Performs well under extreme temperatures.
- Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
- Chemical Resistance: Resilient to corrosive environments.
- Customizable Configurations: Available in various sizes, purities, and bonding options.
Specifications
- Chemical Formula: SiC
- Purity: ≥ 99.9% (custom purities available upon request).
- Density: Optimized for consistent sputtering performance.
- Dimensions: Customizable to fit different sputtering systems.
- Surface Finish: Polished for uniform thin-film application.
Customization Options
- Sizes and Shapes: Tailored to match specific deposition systems.
- Purity Levels: Adjustable to meet precise application requirements.
- Bonding Services: Backing plate options for enhanced thermal conductivity.
- Special Formulations: Composite targets for unique material properties.
Unlock the potential of your thin-film deposition processes with high-quality Silicon Carbide (SiC) sputtering targets. Contact us today to discuss your requirements and explore our customized solutions.