Si Silicon Sputtering Targets

  • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
  • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
  • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
  • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Silicon (Si)
Purity 99.9% – 99.99999% / 3N 3N5 4N 4N5 5N 5N5 6N 6N5 7N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Silicon (Si) sputtering targets are widely used in physical vapor deposition (PVD) processes to create thin films for various industries, including electronics, semiconductors, solar energy, and optics. Silicon is a semiconductor material known for its electrical conductivity, making it a key element in modern technology.

Key Applications:

  • Semiconductors: Silicon is essential for thin films in semiconductor devices such as integrated circuits, transistors, and diodes, forming the foundation of modern electronics.
  • Solar Cells: Silicon thin films are used in photovoltaic cells for converting sunlight into electricity, particularly in thin-film and crystalline silicon solar technologies.
  • Optical Coatings: Silicon films are utilized in optics for antireflective and dielectric coatings, as well as in infrared applications due to its transparency in the infrared spectrum.
  • Microelectronics: Silicon is vital for thin-film deposition in microelectronic components, including sensors and MEMS (Micro-Electro-Mechanical Systems).
  • Thin-Film Transistors (TFTs): Silicon is used in TFTs for displays, particularly in LCD and OLED screens.

Features of Silicon Sputtering Targets:

  • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
  • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
  • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
  • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.

Customization Options:

  • Dimensions: Silicon sputtering targets can be customized in terms of diameter, thickness, and shape to match specific deposition systems.
  • Purity Levels: High-purity silicon (5N or higher) is available to meet the needs of advanced semiconductor and optoelectronic applications.
  • Doping Options: Silicon sputtering targets can be doped with elements like boron (p-type) or phosphorus (n-type) for specific electrical properties.

Silicon sputtering targets from Tinsan Materials offer high-purity Si for thin film deposition in semiconductors, solar cells, and optics. Custom sizes, shapes, and doping options available for optimized PVD performance.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.