SiO (Silicon Monoxide) Sputtering Targets
- High Purity: Ensures superior film quality and consistent performance.
- Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
- Stable and Durable: High thermal and chemical stability for demanding processes.
- Customizable Options: Available in various sizes, purities, and configurations.
Custom products or bulk orders, please contact us for competitive pricing!
- Satisfaction Guaranteed
- No Hassle Refunds
- Secure Payments
Description
| Material | Silicon Monoxide (SiO) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Silicon Monoxide (SiO) sputtering targets are premium-quality materials widely used in thin-film deposition processes. With their excellent optical and electronic properties, SiO targets are ideal for applications in semiconductors, protective coatings, and optical layers. Their versatility and reliability make them essential for both research and industrial use.
Key Applications
- Optical Coatings: Anti-reflective and dielectric coatings for lenses, displays, and photonic devices.
- Electronics: Thin films for semiconductor devices and electronic components.
- Solar Cells: Transparent layers for photovoltaic applications.
- Protective Coatings: Abrasion-resistant and environmental protection layers.
- Research and Development: Functional material investigations in advanced applications.
Features and Benefits
- High Purity: Ensures superior film quality and consistent performance.
- Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
- Stable and Durable: High thermal and chemical stability for demanding processes.
- Customizable Options: Available in various sizes, purities, and configurations.
Specifications
- Chemical Formula: SiO
- Purity: ≥ 99.9% (higher purities available upon request).
- Density: Optimized for uniform sputtering deposition.
- Dimensions: Customizable to meet different sputtering system requirements.
- Surface Finish: Polished for smooth and consistent thin-film application.
Customization Options
- Sizes and Shapes: Tailored dimensions for specific equipment.
- Purity Levels: Adjustable to suit particular application needs.
- Backing Options: Bonding services for improved thermal management.
- Special Formulations: Custom material blends for unique applications.
Maximize your thin-film deposition capabilities with high-quality Silicon Monoxide (SiO) sputtering targets. Reach out to us for premium materials, expert advice, and customized solutions tailored to your needs.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
