SiO2 (Silicon Dioxide) Sputtering Targets

  • Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
  • High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
  • Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
  • Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
  • Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.

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Description

Material SiO2
Purity 99.9% – 99.99999% / 3N 3N5 4N 4N5 5N 5N5 6N 6N5 7N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

SiO₂ (Silicon Dioxide) sputtering targets are widely used in thin-film deposition processes, especially for optical coatings, semiconductor devices, and dielectric layers. Silicon Dioxide, commonly known as silica, is a ceramic material with excellent insulating properties, making it ideal for applications in microelectronics and optics.

Key Applications:

  • Semiconductor Industry: SiO₂ is extensively used as an insulating layer in integrated circuits (ICs) and microchips due to its excellent dielectric properties.
  • Optical Coatings: SiO₂ thin films are applied in optical devices for anti-reflective coatings, mirror coatings, and protective layers due to their transparency and durability.
  • Dielectric Layers: In thin-film capacitors and other electronic devices, SiO₂ serves as a high-quality dielectric material, contributing to device efficiency.
  • Solar Panels: SiO₂ is used in photovoltaic applications for passivation layers, helping to improve the efficiency of solar cells by reducing recombination of charge carriers.
  • Protective Coatings: SiO₂ films are often used as protective barriers against environmental factors like moisture, chemicals, and abrasion in various electronic and optical devices.

Features of SiO₂ Sputtering Targets:

  • Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
  • High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
  • Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
  • Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
  • Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.

Customization Options:

  • Dimensions: SiO₂ sputtering targets are available in a variety of shapes and sizes (discs, plates, and custom geometries) for use in different sputtering systems.
  • Purity Levels: High-purity SiO₂ sputtering targets (up to 99.999%) are available for use in high-precision applications in optics, semiconductors, and microelectronics.
  • Doping: Custom doping of SiO₂ with other elements (such as phosphorus or boron) can be done to adjust the electrical and optical properties for specific applications.

SiO₂ sputtering targets from Tinsan Materials provide high dielectric strength, optical transparency, and chemical stability for thin-film deposition in semiconductors, optical coatings, and protective layers. Custom sizes and high-purity targets available.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.