SnTe (Tin Telluride) Sputtering Targets
- High Purity: Reduces impurities, ensuring superior thin-film quality.
- Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
- Excellent Film Properties: Produces smooth, high-density, and defect-free films.
- Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
- Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
Material | Tin Telluride (SnTe) |
Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
Place of Origin | China |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Tin Telluride (SnTe) sputtering targets are high-performance materials widely used in thin-film deposition for advanced electronics and optoelectronic applications. With its exceptional thermoelectric and phase-change properties, SnTe is an ideal material for developing energy-efficient devices and next-generation technologies. These targets are engineered to ensure uniform and reliable deposition results.
Key Applications
- Thermoelectric Devices: Efficient material for power generation and cooling systems.
- Phase-Change Memory: Essential in non-volatile memory fabrication.
- Optoelectronics: Infrared detectors and modulators for high-performance devices.
- Thin-Film Coatings: Ideal for semiconductors and functional surface treatments.
- Research and Development: Extensively used in materials science and innovation.
Features and Benefits
- High Purity: Reduces impurities, ensuring superior thin-film quality.
- Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
- Excellent Film Properties: Produces smooth, high-density, and defect-free films.
- Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
- Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
Specifications
- Chemical Composition: Tin (Sn) and Tellurium (Te) in a precise 1:1 ratio.
- Purity: ≥ 99.5% (higher purity available upon request).
- Density: Specific to the SnTe compound.
- Target Forms: Circular, rectangular, or custom geometries.
- Sizes: Standard and tailored dimensions to meet deposition equipment requirements.
Customization Options
- Tailored Composition: Adjustments to meet specialized application needs.
- Shape and Size: Custom geometries for compatibility with various sputtering systems.
- Backing Plates: Optional backing for improved thermal conductivity and durability.
- Purity Levels: Ultra-high purity versions for advanced applications.
For premium Tin Telluride (SnTe) sputtering targets designed for optimal performance, contact us today. Let us assist you in finding the perfect solution for your thin-film deposition projects.