TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

TaN (Tantalum Nitride) Sputtering Target

  • Excellent Diffusion Barrier: TaN films provide an effective barrier against the diffusion of metals, such as copper, making them crucial for semiconductor devices.
  • High Electrical Resistivity: TaN has a relatively high electrical resistivity, which makes it suitable for thin-film resistors and other resistive applications.
  • Chemical and Thermal Stability: Tantalum Nitride exhibits excellent stability in extreme chemical and thermal environments, ensuring long-lasting performance in harsh conditions.
  • Hardness and Wear Resistance: TaN films offer superior hardness and wear resistance, making them ideal for protective coatings in demanding industrial applications.
  • Corrosion Resistance: TaN is resistant to corrosion, making it suitable for use in environments where exposure to chemicals or moisture is a concern.

Custom products or bulk orders, please contact us for competitive pricing!

  • Done Satisfaction Guaranteed
  • Done No Hassle Refunds
  • Done Secure Payments
GUARANTEED SAFE CHECKOUT
  • Visa Card
  • MasterCard
  • American Express
  • Discover Card
  • PayPal
Categories: , Tags: , , ,

Description

Material Tantalum Nitrogen
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

TaN (Tantalum Nitride) sputtering targets are essential materials in the fabrication of thin films for various advanced technology sectors, including microelectronics, semiconductors, and optical coatings. Tantalum Nitride is known for its excellent combination of electrical conductivity, chemical stability, and high hardness, making it a popular material for wear-resistant coatings, diffusion barriers, and resistive films.

Key Applications:

  • Semiconductors: TaN is widely used as a diffusion barrier in integrated circuits, particularly in copper interconnects, to prevent copper diffusion into silicon or dielectric layers.
  • Thin Film Resistors: Due to its stable resistive properties, TaN is frequently used in thin-film resistors for precision electronic components.
  • Wear-resistant Coatings: TaN is applied as a hard protective coating in tools, cutting blades, and machine components where high hardness and wear resistance are critical.
  • Optical Coatings: Tantalum Nitride is used in optical coatings for anti-reflective and dielectric applications, particularly in harsh environments due to its excellent chemical stability.
  • MEMS Devices: TaN thin films are employed in Micro-Electro-Mechanical Systems (MEMS) devices, providing stability and reliability in micro-scale components.

Features of TaN Sputtering Targets:

  • Excellent Diffusion Barrier: TaN films provide an effective barrier against the diffusion of metals, such as copper, making them crucial for semiconductor devices.
  • High Electrical Resistivity: TaN has a relatively high electrical resistivity, which makes it suitable for thin-film resistors and other resistive applications.
  • Chemical and Thermal Stability: Tantalum Nitride exhibits excellent stability in extreme chemical and thermal environments, ensuring long-lasting performance in harsh conditions.
  • Hardness and Wear Resistance: TaN films offer superior hardness and wear resistance, making them ideal for protective coatings in demanding industrial applications.
  • Corrosion Resistance: TaN is resistant to corrosion, making it suitable for use in environments where exposure to chemicals or moisture is a concern.

Customization Options:

  • Dimensions: TaN sputtering targets are available in a variety of sizes and shapes, including discs, rectangular plates, and custom geometries to suit specific deposition systems.
  • Purity: High-purity TaN targets (up to 99.999%) are offered for applications requiring high-quality thin films with minimal contamination.
  • Target Bonding: Targets can be bonded to backing plates to improve thermal conductivity and enhance the overall sputtering process, ensuring a longer target lifespan and higher efficiency.

TaN (Tantalum Nitride) sputtering targets from Tinsan Materials are ideal for diffusion barriers, thin-film resistors, wear-resistant coatings, and semiconductor applications. High-purity and customizable sizes available for advanced thin-film deposition.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.

Related products