Ti2O3 (Titanium(III) Oxide) Sputtering Targets
- High Purity: Ensures uniform film deposition with minimal contamination.
- Excellent Optical Properties: Provides transparency and reflectivity for optical applications.
- Electrical Conductivity: Suitable for applications requiring conductive thin films.
- Durable and Stable: Resistant to chemical and thermal degradation, ensuring long-lasting performance.
- Versatile Compatibility: Can be used with various sputtering systems and processes.
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Description
| Material | Titanium(III) Oxide (Ti₂O₃) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Titanium(III) Oxide (Ti₂O₃) sputtering targets are specialized materials designed for thin-film deposition processes, offering excellent electrical conductivity, optical properties, and chemical stability. These targets are widely used in applications such as transparent conductive films, electronic components, and advanced coatings, providing high performance and reliability in various industrial sectors.
Key Applications
- Transparent Conductive Films: Used in display technologies, photovoltaics, and optical devices for superior transparency and conductivity.
- Electronic Components: Ideal for thin-film resistors, capacitors, and other electronic devices requiring stable performance.
- Protective Coatings: Offers corrosion resistance and durability for industrial and architectural applications.
- Optical Coatings: Enhances reflectivity and light manipulation in optical systems.
Features and Benefits
- High Purity: Ensures uniform film deposition with minimal contamination.
- Excellent Optical Properties: Provides transparency and reflectivity for optical applications.
- Electrical Conductivity: Suitable for applications requiring conductive thin films.
- Durable and Stable: Resistant to chemical and thermal degradation, ensuring long-lasting performance.
- Versatile Compatibility: Can be used with various sputtering systems and processes.
Specifications
- Purity: ≥99.9% for high-quality film deposition.
- Shape: Available in planar, disc, and custom shapes to fit sputtering equipment.
- Density: Approx. 4.49 g/cm³.
- Dimensions: Customizable sizes to meet specific project requirements.
Customization Options
- Dimensions: Custom sizes and shapes tailored to your sputtering system.
- Purity Levels: Enhanced purity options available for specialized applications.
- Backings: Optional backing plates for improved sputtering stability.
Contact our team to discuss your project needs or request a quote. We provide expert advice and solutions for selecting the optimal Ti₂O₃ sputtering target for your application.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
