Ti3O5 (Titanium Oxide) Sputtering Targets

  • High Purity: Ensures consistent and reliable thin-film quality.
  • Stable Performance: Exceptional thermal and chemical stability for demanding applications.
  • Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
  • Optical Clarity: Produces transparent coatings with excellent optical properties.
  • Durability: High resistance to mechanical stress and environmental degradation.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Titanium Oxide (Ti₃O₅)
Purity 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Titanium Oxide (Ti₃O₅) sputtering targets are high-performance materials used in thin-film deposition processes. Known for their exceptional optical, electronic, and thermal properties, these targets are ideal for producing functional coatings in advanced technological applications. Ti₃O₅ films are commonly used in optics, electronics, energy storage devices, and protective layers.

Key Applications

  • Optical Coatings: Improves reflectivity, transparency, and durability for lenses, displays, and optical instruments.
  • Electronic Components: Utilized in semiconductors, resistors, and sensors for enhanced performance.
  • Energy Storage Devices: Applied in advanced batteries and supercapacitors for improved efficiency.
  • Protective Layers: Offers corrosion and wear resistance in demanding environments.
  • Photocatalysis: Promotes efficient chemical reactions in environmental and energy applications.

Features and Benefits

  • High Purity: Ensures consistent and reliable thin-film quality.
  • Stable Performance: Exceptional thermal and chemical stability for demanding applications.
  • Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
  • Optical Clarity: Produces transparent coatings with excellent optical properties.
  • Durability: High resistance to mechanical stress and environmental degradation.

Specifications

  • Purity: ≥99.5% for high-quality thin-film production.
  • Density: Approx. 4.49 g/cm³.
  • Shapes: Planar, rotary, and custom geometries.
  • Sizes: Customizable to meet equipment specifications.
  • Surface Finish: Precision-machined for uniform sputtering performance.

Customization Options

  • Dimensions and Shapes: Tailored to match specific equipment and deposition requirements.
  • Purity Levels: Enhanced purity for specialized applications.
  • Bonding Services: Backing plate options available for improved thermal and mechanical stability.

Our team is ready to help you find the perfect Ti₃O₅ sputtering target for your application. Contact us today to discuss your requirements, request a quote, or explore our customization services.