Ti3O5 (Titanium Oxide) Sputtering Targets
- High Purity: Ensures consistent and reliable thin-film quality.
- Stable Performance: Exceptional thermal and chemical stability for demanding applications.
- Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
- Optical Clarity: Produces transparent coatings with excellent optical properties.
- Durability: High resistance to mechanical stress and environmental degradation.
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Description
Material | Titanium Oxide (Ti₃O₅) |
Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Titanium Oxide (Ti₃O₅) sputtering targets are high-performance materials used in thin-film deposition processes. Known for their exceptional optical, electronic, and thermal properties, these targets are ideal for producing functional coatings in advanced technological applications. Ti₃O₅ films are commonly used in optics, electronics, energy storage devices, and protective layers.
Key Applications
- Optical Coatings: Improves reflectivity, transparency, and durability for lenses, displays, and optical instruments.
- Electronic Components: Utilized in semiconductors, resistors, and sensors for enhanced performance.
- Energy Storage Devices: Applied in advanced batteries and supercapacitors for improved efficiency.
- Protective Layers: Offers corrosion and wear resistance in demanding environments.
- Photocatalysis: Promotes efficient chemical reactions in environmental and energy applications.
Features and Benefits
- High Purity: Ensures consistent and reliable thin-film quality.
- Stable Performance: Exceptional thermal and chemical stability for demanding applications.
- Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
- Optical Clarity: Produces transparent coatings with excellent optical properties.
- Durability: High resistance to mechanical stress and environmental degradation.
Specifications
- Purity: ≥99.5% for high-quality thin-film production.
- Density: Approx. 4.49 g/cm³.
- Shapes: Planar, rotary, and custom geometries.
- Sizes: Customizable to meet equipment specifications.
- Surface Finish: Precision-machined for uniform sputtering performance.
Customization Options
- Dimensions and Shapes: Tailored to match specific equipment and deposition requirements.
- Purity Levels: Enhanced purity for specialized applications.
- Bonding Services: Backing plate options available for improved thermal and mechanical stability.
Our team is ready to help you find the perfect Ti₃O₅ sputtering target for your application. Contact us today to discuss your requirements, request a quote, or explore our customization services.