TiB2 (Titanium Diboride) Sputtering Targets

  • Exceptional Hardness: Provides superior durability and wear resistance.
  • High Thermal Stability: Performs well under extreme temperatures.
  • Electrical Conductivity: Suitable for electronic applications requiring conductive layers.
  • Corrosion Resistance: Withstands harsh chemical environments.
  • High Purity: Ensures consistent thin-film quality and reliable performance.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Titanium Diboride (TiB₂)
Purity 99.5% – 99.999% / 2N5 3N 3N5 4N 4N5 5N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Titanium Diboride (TiB₂) sputtering targets are highly valued for their exceptional hardness, chemical stability, and superior conductivity. These targets are used in advanced thin-film deposition processes to create coatings with extreme wear resistance, high thermal stability, and excellent electrical properties. TiB₂ is a critical material in industries requiring robust coatings, including aerospace, electronics, and cutting tools.

Key Applications

  • Wear-Resistant Coatings: Ideal for tools and machinery exposed to high wear and tear.
  • Microelectronics: Used in thin films for semiconductor components due to excellent conductivity.
  • Aerospace: Protects components against extreme conditions and oxidation.
  • Optical Coatings: Provides scratch-resistant and reflective coatings for optics.
  • Decorative Coatings: Creates aesthetic and durable finishes on consumer products.

Features and Benefits

  • Exceptional Hardness: Provides superior durability and wear resistance.
  • High Thermal Stability: Performs well under extreme temperatures.
  • Electrical Conductivity: Suitable for electronic applications requiring conductive layers.
  • Corrosion Resistance: Withstands harsh chemical environments.
  • High Purity: Ensures consistent thin-film quality and reliable performance.

Specifications

  • Purity: ≥ 99.5% for high-quality film deposition.
  • Density: Optimized for efficient sputtering processes.
  • Shape: Available in discs, plates, and other custom geometries.
  • Dimensions: Tailored to fit various sputtering systems.

Customization Options

  • Custom Shapes and Sizes: Designed to meet specific equipment and application needs.
  • Backing Plates: Provided for enhanced thermal management and mechanical support.
  • Tailored Composition: Adjustments for specific film properties or performance requirements.

Reach out to our experts for more information about TiB₂ sputtering targets. We offer comprehensive support, including material selection, customization, and competitive pricing, to meet your thin-film coating needs.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.