Tin Sulfide (SnS) Sputtering Targets

  • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
  • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
  • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
  • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
  • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Tin Sulfide (SnS)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Tin Sulfide (SnS) sputtering targets are high-quality materials widely used in the fabrication of thin films for photovoltaic cells, optoelectronics, and semiconductors. With excellent optical and electrical properties, SnS is a cost-effective and environmentally friendly alternative for various advanced material applications.

Key Applications

  • Photovoltaics: Ideal for absorber layers in thin-film solar cells.
  • Optoelectronic Devices: Suitable for photodetectors, light-emitting diodes, and optical modulators.
  • Semiconductors: Used in applications requiring a narrow bandgap material.
  • Energy Harvesting: Enables efficient energy conversion in thermoelectric devices.
  • Thin-Film Transistors (TFTs): Provides reliable performance in electronic displays and circuits.

Features and Benefits

  • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
  • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
  • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
  • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
  • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.

Specifications

  • Purity: ≥ 99.9%
  • Density: Optimized for uniform thin-film deposition.
  • Dimensions: Custom sizes and shapes available.
  • Crystal Structure: Orthorhombic phase for enhanced material performance.
  • Surface Finish: Precision-polished surface for improved sputtering efficiency.

Customization Options

  • Size and Shape Variability: Custom dimensions to fit different sputtering systems.
  • Alloying Options: Integration with other elements to enhance specific properties.
  • Bonding Services: Backing plates available for improved thermal and mechanical stability.
  • Tailored Purity Levels: Adjustable purity to match application requirements.

For high-quality Tin Sulfide (SnS) sputtering targets, tailored solutions, and expert support, reach out to us. We are committed to meeting your thin-film deposition needs with precision and reliability.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.