TiO (Titanium Monoxide) Sputtering Targets
- High Purity: Ensures superior film quality and minimal contamination.
- Stable Properties: Excellent thermal and chemical stability under deposition conditions.
- Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
- Versatile Performance: Suitable for a wide range of thin-film applications.
- Durability: High mechanical strength for extended usability.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Titanium Monoxide (TiO) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Titanium Monoxide (TiO) sputtering targets are specialized materials used in the deposition of thin films for advanced technological applications. TiO films exhibit unique electronic, optical, and structural properties, making them essential for use in semiconductors, photovoltaics, sensors, and other innovative devices. These targets are precision-engineered to ensure high performance and reliability in vacuum deposition processes.
Key Applications
- Semiconductor Devices: Enhances conductivity and performance in microelectronics.
- Photovoltaics: Improves efficiency and durability in solar cells.
- Optical Coatings: Delivers high reflectivity and durability for lenses, mirrors, and filters.
- Sensors: Key material for fabricating gas and pressure sensors with enhanced sensitivity.
- Energy Storage: Utilized in advanced batteries and supercapacitors.
Features and Benefits
- High Purity: Ensures superior film quality and minimal contamination.
- Stable Properties: Excellent thermal and chemical stability under deposition conditions.
- Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
- Versatile Performance: Suitable for a wide range of thin-film applications.
- Durability: High mechanical strength for extended usability.
Specifications
- Purity: ≥99.5% for high-quality thin-film production.
- Density: Approx. 4.95 g/cm³.
- Shapes: Planar, rotary, and custom geometries.
- Sizes: Adaptable to meet unique deposition system specifications.
- Surface Finish: Precision-polished for uniform sputtering performance.
Customization Options
- Dimensions and Shapes: Configurable to match specific equipment needs.
- Purity Levels: Higher purities available for advanced applications.
- Bonding Services: Optional backing plate bonding for improved thermal performance.
Looking for the ideal TiO sputtering target for your application? Contact us today to discuss your requirements, request a quote, or explore our customization options. Our team is ready to assist you!
