TiSb (Titanium Antimony) Sputtering Targets
- High Purity: Ensures consistent film quality and reduces defects in deposited layers.
- Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
- Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
- Customizable Options: Available in various compositions and dimensions to meet specific requirements.
- Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
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Description
| Material | Titanium Antimony (TiSb) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Titanium Antimony (TiSb) sputtering targets are advanced materials made from a combination of titanium and antimony. These targets are widely utilized in thin-film deposition processes for creating high-quality coatings in semiconductor devices, optical films, and functional materials. TiSb sputtering targets are known for their excellent uniformity, high-purity composition, and superior adhesion properties, making them ideal for demanding industrial and research applications.
Key Applications
- Semiconductor Industry: For thin-film coatings in microelectronics and integrated circuits.
- Optical Coatings: Used in antireflective and reflective layers for optics and photonic devices.
- Data Storage: Applied in magnetic and phase-change memory materials.
- Energy Devices: Functional layers in solar cells and other energy harvesting devices.
- Research and Development: Ideal for the development of advanced materials in academic and industrial laboratories.
Features and Benefits
- High Purity: Ensures consistent film quality and reduces defects in deposited layers.
- Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
- Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
- Customizable Options: Available in various compositions and dimensions to meet specific requirements.
- Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
Specifications
- Chemical Composition: Titanium (Ti) and Antimony (Sb) alloy.
- Purity: ≥ 99.5% (custom purity levels available upon request).
- Target Forms: Circular, rectangular, and custom geometries.
- Density: Dependent on the specific Ti-Sb composition ratio.
- Sizes: Standard and custom sizes available to suit different sputtering systems.
Customization Options
- Composition Ratios: Tailored Ti and Sb ratios to meet specific application needs.
- Dimensions: Custom sizes and shapes to accommodate various deposition systems.
- Bonding Services: Optional backing plate bonding for enhanced thermal and mechanical performance.
- Purity Levels: Ultra-high purity options for applications requiring minimal contamination.
Explore our high-quality Titanium Antimony (TiSb) sputtering targets and find the perfect solution for your thin-film coating needs. Contact us today to discuss your requirements and receive expert assistance.
