TiTe2 (Titanium Ditelluride) Sputtering Targets

  • High Purity: Ensures optimal film quality and performance.
  • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
  • Thermal Stability: Resilient under high-temperature deposition processes.
  • Layered Structure: Ideal for 2D material synthesis and related technologies.
  • Customizable Specifications: Available in tailored sizes, shapes, and configurations.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Titanium Ditelluride (TiTe₂)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Titanium Ditelluride (TiTe₂) sputtering targets are specialized materials designed for thin-film deposition in advanced electronic, optoelectronic, and thermoelectric applications. Known for its unique layered structure and excellent electrical and thermal properties, TiTe₂ is an essential material for creating high-performance coatings in cutting-edge technologies.

Key Applications

  • Semiconductor Devices: Used in thin-film transistors and other microelectronic components.
  • Thermoelectric Materials: Enables efficient energy conversion in power generation and cooling systems.
  • Optoelectronics: Enhances performance in photodetectors, modulators, and sensors.
  • Research & Development: Facilitates exploration in 2D materials and quantum technologies.

Features and Benefits

  • High Purity: Ensures optimal film quality and performance.
  • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
  • Thermal Stability: Resilient under high-temperature deposition processes.
  • Layered Structure: Ideal for 2D material synthesis and related technologies.
  • Customizable Specifications: Available in tailored sizes, shapes, and configurations.

Specifications

  • Purity: ≥ 99.9% for reliable thin-film deposition.
  • Density: Optimized for efficient sputtering and uniform film formation.
  • Dimensions: Standard and custom sizes available.
  • Forms: Discs, plates, and other geometries to fit diverse sputtering systems.
  • Surface Finish: Smooth and polished for consistent deposition performance.

Customization Options

  • Size and Shape Adjustments: Designed to meet specific equipment requirements.
  • Bonding Services: Backing plate options for enhanced heat management and mechanical stability.
  • Alternative Compositions: Custom material blends for specialized applications.
  • Packaging Solutions: Protective measures for safe storage and transportation.

For high-quality Titanium Ditelluride (TiTe₂) sputtering targets, contact our team today. We provide expert consultation, precision manufacturing, and fast delivery to meet the demands of your thin-film projects.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.