Tm2O3 (Thulium Oxide) Sputtering Targets
- High Purity: Ensures optimal performance and low impurity levels in thin films.
- Exceptional Optical Properties: Ideal for laser and photonic applications.
- Thermal Stability: Suitable for high-temperature processes.
- Customizable Specifications: Adaptable to diverse application needs.
- Compatibility: Works with various sputtering systems, including RF and DC.
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Description
Material | Thulium Oxide (Tm₂O₃) |
Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
Place of Origin | China |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Thulium Oxide (Tm₂O₃) sputtering targets are precision-engineered materials for thin-film deposition in advanced research and industrial applications. With its unique optical and electronic properties, Tm₂O₃ is widely used in high-tech fields such as optoelectronics, laser systems, and specialized coatings. Its high purity and customizable features make it ideal for cutting-edge thin-film technologies.
Key Applications
- Optoelectronics: Thin films for photonics and light-emitting devices.
- Laser Systems: Coatings for high-performance solid-state lasers.
- Semiconductors: Dielectric layers and specialized electronic applications.
- Research & Development: Materials science and thin-film experiments.
Features and Benefits
- High Purity: Ensures optimal performance and low impurity levels in thin films.
- Exceptional Optical Properties: Ideal for laser and photonic applications.
- Thermal Stability: Suitable for high-temperature processes.
- Customizable Specifications: Adaptable to diverse application needs.
- Compatibility: Works with various sputtering systems, including RF and DC.
Specifications
- Chemical Formula: Thulium Oxide (Tm₂O₃).
- Purity: ≥ 99.9% (higher purities available upon request).
- Density: ~8.6 g/cm³.
- Target Shapes: Round, rectangular, and custom geometries.
- Dimensions: Customized to meet specific system requirements.
Customization Options
- Target Size and Shape: Customizable dimensions and forms for seamless integration with sputtering equipment.
- Purity Levels: Ultra-high purity options available for advanced thin-film applications.
- Bonding Services: Backing plate options for improved durability and thermal management.
Upgrade your thin-film processes with high-quality Thulium Oxide (Tm₂O₃) sputtering targets. Contact us for tailored solutions and expert assistance to meet your project’s needs.