Tm2O3 (Thulium Oxide) Sputtering Targets

  • High Purity: Ensures optimal performance and low impurity levels in thin films.
  • Exceptional Optical Properties: Ideal for laser and photonic applications.
  • Thermal Stability: Suitable for high-temperature processes.
  • Customizable Specifications: Adaptable to diverse application needs.
  • Compatibility: Works with various sputtering systems, including RF and DC.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Thulium Oxide (Tm₂O₃)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Thulium Oxide (Tm₂O₃) sputtering targets are precision-engineered materials for thin-film deposition in advanced research and industrial applications. With its unique optical and electronic properties, Tm₂O₃ is widely used in high-tech fields such as optoelectronics, laser systems, and specialized coatings. Its high purity and customizable features make it ideal for cutting-edge thin-film technologies.

Key Applications

  • Optoelectronics: Thin films for photonics and light-emitting devices.
  • Laser Systems: Coatings for high-performance solid-state lasers.
  • Semiconductors: Dielectric layers and specialized electronic applications.
  • Research & Development: Materials science and thin-film experiments.

Features and Benefits

  • High Purity: Ensures optimal performance and low impurity levels in thin films.
  • Exceptional Optical Properties: Ideal for laser and photonic applications.
  • Thermal Stability: Suitable for high-temperature processes.
  • Customizable Specifications: Adaptable to diverse application needs.
  • Compatibility: Works with various sputtering systems, including RF and DC.

Specifications

  • Chemical Formula: Thulium Oxide (Tm₂O₃).
  • Purity: ≥ 99.9% (higher purities available upon request).
  • Density: ~8.6 g/cm³.
  • Target Shapes: Round, rectangular, and custom geometries.
  • Dimensions: Customized to meet specific system requirements.

Customization Options

  • Target Size and Shape: Customizable dimensions and forms for seamless integration with sputtering equipment.
  • Purity Levels: Ultra-high purity options available for advanced thin-film applications.
  • Bonding Services: Backing plate options for improved durability and thermal management.

Upgrade your thin-film processes with high-quality Thulium Oxide (Tm₂O₃) sputtering targets. Contact us for tailored solutions and expert assistance to meet your project’s needs.