Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets
- High Purity: Ensures minimal contamination for superior thin-film properties.
- Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
- Magnetic and Optical Excellence: Delivers high-performance film characteristics.
- Robust Performance: Supports a wide range of deposition techniques.
- Customizable Options: Tailored specifications for diverse deposition systems.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Thulium Iron Garnet (Tm₃Fe₅O₁₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering targets are advanced materials used for thin-film deposition in high-performance magneto-optical and photonic applications. Known for their excellent magnetic and optical properties, these targets are critical in creating high-quality thin films for cutting-edge technologies. With precise stoichiometry and exceptional purity, Tm₃Fe₅O₁₂ targets ensure consistent and reliable results.
Key Applications
- Magneto-Optical Devices: Essential for isolators, circulators, and modulators.
- Photonic Applications: Key material in integrated photonic circuits and waveguides.
- Spintronics: Thin-film creation for next-generation magnetic storage and sensors.
- Research and Development: Widely used in optical and magnetic material studies.
- Specialized Coatings: Ideal for advanced optical and magnetic thin-film layers.
Features and Benefits
- High Purity: Ensures minimal contamination for superior thin-film properties.
- Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
- Magnetic and Optical Excellence: Delivers high-performance film characteristics.
- Robust Performance: Supports a wide range of deposition techniques.
- Customizable Options: Tailored specifications for diverse deposition systems.
Specifications
- Chemical Formula: Tm₃Fe₅O₁₂
- Purity: ≥ 99.5% (higher purities available upon request).
- Density: Specific to the garnet material.
- Target Forms: Circular, rectangular, or custom geometries.
- Sizes: Standard and customized dimensions to fit sputtering equipment.
Customization Options
- Tailored Composition: Adjusted material formulations for specific research needs.
- Shape and Size: Custom geometries to accommodate unique sputtering setups.
- Purity Levels: Ultra-high purity versions for specialized applications.
- Backing Plates: Available for enhanced durability and heat dissipation.
For premium Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering targets designed for precise thin-film deposition, reach out to us today. We provide tailored solutions to meet your advanced magneto-optical and photonic needs.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
