W Tungsten Sputtering Target

Tungsten sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material Tungsten (W)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 1000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Tungsten (W) sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.

Key Features:

  • Purity: Tungsten sputtering targets are typically available in high purity levels, such as 99.95% (3N5) or higher, to ensure the deposition of high-quality and consistent films.
  • Shapes and Sizes: These targets are available in various forms, including discs, plates, and custom shapes, to suit different sputtering systems and specific application requirements.

Applications:

  • Semiconductor Industry: Tungsten is extensively used in the semiconductor industry for creating interconnects, gate electrodes, and diffusion barriers in integrated circuits (ICs) and other microelectronic devices. Its high melting point and low resistivity make it ideal for these applications.
  • Thin-Film Resistors: Tungsten is employed in the production of thin-film resistors, where its stability and resistance to oxidation are critical.
  • X-ray and Radiation Shielding: Tungsten’s high density and ability to absorb X-rays and other radiation make it an excellent material for creating thin films in medical imaging devices and radiation shielding applications.
  • Aerospace and Defense: Tungsten coatings are used in aerospace and defense applications, particularly for components exposed to extreme temperatures and wear. Tungsten’s high-temperature stability and strength make it suitable for these harsh environments.
  • Energy Sector: Tungsten is also used in the energy sector, particularly in the production of thin films for solar cells and in components for nuclear reactors due to its ability to withstand extreme conditions.

Customization Options:

  • Thickness: The thickness of the tungsten coating can be precisely controlled during the sputtering process, allowing for customized solutions to meet specific application needs.
  • Alloys: Tungsten sputtering targets can be produced as pure tungsten or in alloyed forms, such as tungsten-titanium (W-Ti) or tungsten-copper (W-Cu), depending on the desired properties of the thin film.
  • Backing Plates: Tungsten targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.

Tungsten sputtering targets are widely used in physical vapor deposition (PVD) processes to create thin tungsten films on various substrates. Tungsten, known for its high melting point, excellent thermal and electrical conductivity, and outstanding mechanical strength, is a crucial material in industries such as electronics, aerospace, and energy.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.