Vanadium Carbide (VC) Sputtering Targets
- Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
- Chemical Stability: Maintains performance in harsh and reactive environments.
- High Thermal Conductivity: Efficiently dissipates heat in critical applications.
- Uniform Deposition: Ensures consistent film quality with minimal defects.
- Customizable Options: Available in various sizes and purities for specialized applications.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Vanadium Carbide (VC) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Vanadium Carbide (VC) sputtering targets are advanced materials utilized in thin-film deposition processes, offering exceptional hardness, chemical stability, and thermal conductivity. These targets are ideal for producing wear-resistant coatings, decorative layers, and functional films in high-performance applications across various industries, including electronics, optics, and aerospace.
Key Applications
- Wear-Resistant Coatings: Extends the lifespan of tools, dies, and machine components.
- Decorative Films: Provides aesthetic finishes with enhanced durability.
- Electronic Components: Used in semiconductors and other high-performance electronic devices.
- Optical Coatings: Enhances reflectivity and durability in optical systems.
- Thermal Barrier Coatings: Protects components from high-temperature environments.
Features and Benefits
- Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
- Chemical Stability: Maintains performance in harsh and reactive environments.
- High Thermal Conductivity: Efficiently dissipates heat in critical applications.
- Uniform Deposition: Ensures consistent film quality with minimal defects.
- Customizable Options: Available in various sizes and purities for specialized applications.
Specifications
- Purity: ≥99.5% for optimal thin-film quality.
- Density: Approx. 5.77 g/cm³.
- Shape: Available in planar, rotary, and custom shapes.
- Dimensions: Customizable to fit specific sputtering systems.
Customization Options
- Size and Shape: Tailored dimensions for your equipment and application needs.
- Purity Levels: Enhanced purity options for advanced applications.
- Backing Plates: Optional backing plates for improved thermal and mechanical stability.
Let our experts assist you in selecting the perfect VC sputtering target for your project. Contact us today to request a quote or learn more about our customization options.
