Vanadium Nitride (VN) Sputtering Targets
- High hardness and wear resistance, ideal for demanding environments
- Excellent corrosion resistance, prolonging the life of components
- Stable and consistent film quality for precise deposition
- Suitable for high-temperature and high-performance applications
- Enhanced durability in harsh operational conditions
- Compatible with various sputtering systems and deposition techniques
Custom products or bulk orders, please contact us for competitive pricing!
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Description
Material | Vanadium Nitride (VN) |
Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Vanadium Nitride (VN) sputtering targets are advanced materials used in various thin-film deposition processes. VN is a refractory compound with high hardness, excellent wear resistance, and significant corrosion resistance, making it ideal for applications requiring durable, high-performance coatings. These targets are commonly used in industries such as semiconductor manufacturing, aerospace, and automotive, for producing hard coatings and specialized electronic devices.
Key Applications
- Wear-resistant coatings for industrial tools and components
- Hard coatings for cutting tools, molds, and dies
- Thin films for semiconductor and microelectronics applications
- Coatings for decorative and protective layers
- Surface treatments in aerospace and automotive industries
- Magnetic and superconducting applications
Features and Benefits
- High hardness and wear resistance, ideal for demanding environments
- Excellent corrosion resistance, prolonging the life of components
- Stable and consistent film quality for precise deposition
- Suitable for high-temperature and high-performance applications
- Enhanced durability in harsh operational conditions
- Compatible with various sputtering systems and deposition techniques
Specifications
- Material: Vanadium Nitride (VN)
- Purity: Typically ≥ 99.9%
- Density: 6.0 g/cm³
- Melting Point: 2910°C
- Available Forms: Circular, Rectangular, and Custom Shapes
- Size Range: Custom sizes available upon request
- Coating: Typically available without coating, or can be custom-coated for specific applications
Customization Options
- Custom sizes and shapes to suit specific requirements
- Tailored purity levels and densities
- Special coating options for enhanced performance
- Target bonding options for easy integration into sputtering systems
- Custom fabrication to meet unique project specifications
For more information or to request a quote, please contact our sales team. We offer a wide range of Vanadium Nitride sputtering targets and can provide custom solutions to meet your specific needs. Reach out to us for inquiries, pricing, and technical support.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.