V Vanadium Sputtering Target
Vanadium sputtering targets are essential in industries that require strong, corrosion-resistant, and stable thin films. Their use in semiconductors, aerospace, superconducting materials, and energy storage highlights the versatility and importance of vanadium in advanced technology applications.
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Description
| Material | Vanadium (V) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 1000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Vanadium (V) sputtering targets are essential in industries that require strong, corrosion-resistant, and stable thin films. Their use in semiconductors, aerospace, superconducting materials, and energy storage highlights the versatility and importance of vanadium in advanced technology applications.
Key Features:
- Purity: Vanadium sputtering targets are available in high purity levels, typically 99.9% (3N) or higher, ensuring the deposition of high-quality and consistent films.
- Shapes and Sizes: These targets come in various forms, including discs, plates, and custom shapes, to suit different sputtering systems and specific application requirements.
Applications:
- Semiconductor Industry: Vanadium is used in the semiconductor industry for creating thin films that serve as diffusion barriers, electrodes, and other components in microelectronic devices. Its stability and resistance to oxidation make it an excellent choice for these applications.
- Superconducting Materials: Vanadium is a critical element in the production of superconducting materials, which are used in advanced electronic devices, MRI machines, and other high-performance applications.
- Aerospace and Defense: Vanadium coatings are used in aerospace and defense applications to enhance the durability and performance of components exposed to extreme conditions, such as high temperatures and corrosive environments.
- Energy Storage: Vanadium is employed in energy storage technologies, particularly in vanadium redox flow batteries (VRFBs), where its ability to exist in multiple oxidation states allows for efficient energy storage and release.
- Alloying Agent: Vanadium is often used as an alloying element in steel and titanium alloys to improve strength, toughness, and resistance to wear and corrosion. Sputtering these alloys allows for precise control of film composition and thickness.
Customization Options:
- Thickness: The thickness of the vanadium coating can be precisely controlled during the sputtering process, allowing for tailored solutions to meet specific application needs.
- Alloys: Vanadium sputtering targets can be produced as pure vanadium or in alloyed forms, such as vanadium-titanium (V-Ti) or vanadium-aluminum (V-Al), depending on the desired properties of the thin film.
- Backing Plates: Vanadium targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.
Vanadium sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin vanadium films onto various substrates. Vanadium is known for its high strength, excellent corrosion resistance, and ability to form stable compounds with other elements, making it a valuable material in a range of high-tech applications, particularly in electronics, aerospace, and energy sectors.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
