WSi2 (Tungsten Disilicide) Sputtering Targets
- Exceptional Thermal Stability: Withstands high-temperature operations.
- High Electrical Conductivity: Ideal for conductive and resistive layers.
- Oxidation Resistance: Reliable performance in harsh environments.
- High Purity: Ensures uniform deposition and minimal contamination.
- Customizability: Available in various dimensions and purities to suit specific needs.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Tungsten Disilicide (WSi₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Tungsten Disilicide (WSi₂) sputtering targets are high-performance materials widely utilized in thin-film deposition applications. Renowned for their exceptional thermal stability, electrical conductivity, and resistance to oxidation, WSi₂ targets are essential in advanced semiconductor devices, microelectronics, and protective coatings. These targets enable precise deposition processes, ensuring reliable performance in demanding environments.
Key Applications
- Semiconductors: Thin films for gates, interconnects, and resistive layers in integrated circuits.
- Microelectronics: Deposition of high-performance conductive and diffusion barrier layers.
- Aerospace and Automotive: Protective and functional coatings for high-temperature components.
- Energy Devices: Thin films for photovoltaic and thermoelectric systems.
- Research and Development: Material studies in nanotechnology and electronics.
Features and Benefits
- Exceptional Thermal Stability: Withstands high-temperature operations.
- High Electrical Conductivity: Ideal for conductive and resistive layers.
- Oxidation Resistance: Reliable performance in harsh environments.
- High Purity: Ensures uniform deposition and minimal contamination.
- Customizability: Available in various dimensions and purities to suit specific needs.
Specifications
- Chemical Formula: WSi₂
- Purity: ≥ 99.5% (higher purities available upon request).
- Density: ~9.3 g/cm³
- Shapes: Circular, rectangular, and custom geometries.
- Sizes: Standard and custom dimensions available for various sputtering systems.
Customization Options
- Geometry: Tailored shapes and sizes for diverse sputtering setups.
- Purity Levels: Ultra-high purity options for specialized applications.
- Backing Plates: Integration for enhanced thermal management and stability.
- Custom Compositions: Designed to meet unique application requirements.
Enhance your thin-film deposition processes with high-quality Tungsten Disilicide (WSi₂) sputtering targets. Reach out to us for expert guidance, custom options, and reliable solutions tailored to your specific needs.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
