WTe2 (Tungsten Telluride) Sputtering Targets
- High Purity: Ensures superior thin-film quality with minimal impurities.
- Layered Structure: Supports the formation of ultra-thin films with excellent properties.
- Stable Composition: Reliable and consistent deposition outcomes.
- Versatile Application: Compatible with various sputtering systems and techniques.
- Customizable Options: Tailored targets for specific research and industrial requirements.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Tungsten Telluride (WTe₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Tungsten Telluride (WTe₂) sputtering targets are premium materials designed for thin-film deposition in advanced electronic, optoelectronic, and thermoelectric applications. With its unique layered structure and exceptional electrical and thermal properties, WTe₂ is widely utilized in the development of next-generation devices such as topological insulators and semiconductors. High purity and precise composition ensure consistent performance for demanding applications.
Key Applications
- Topological Insulators: Critical in quantum computing and advanced electronics.
- Optoelectronic Devices: Ideal for photodetectors and light-emitting diodes (LEDs).
- Thermoelectric Materials: Enhances energy conversion efficiency.
- 2D Material Research: Widely used in developing novel layered materials.
- High-Performance Electronics: Thin-film deposition for semiconductors and transistors.
Features and Benefits
- High Purity: Ensures superior thin-film quality with minimal impurities.
- Layered Structure: Supports the formation of ultra-thin films with excellent properties.
- Stable Composition: Reliable and consistent deposition outcomes.
- Versatile Application: Compatible with various sputtering systems and techniques.
- Customizable Options: Tailored targets for specific research and industrial requirements.
Specifications
- Chemical Formula: WTe₂
- Purity: ≥ 99.5% (higher purities available upon request).
- Density: Specific to the WTe₂ material properties.
- Target Forms: Circular, rectangular, or custom geometries.
- Sizes: Standard and customized dimensions for sputtering equipment compatibility.
Customization Options
- Adjustable Composition: Tailored formulations for specific application needs.
- Geometry Customization: Flexible shapes and sizes to fit unique setups.
- Enhanced Purity Levels: Ultra-high purity versions available.
- Backing Plates: Optional for improved heat management and durability.
For top-tier Tungsten Telluride (WTe₂) sputtering targets tailored for advanced electronic and optoelectronic applications, contact us today. We offer custom solutions to meet your precise material and deposition needs.
