ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

ZrB2 (Zirconium Diboride) Sputtering Target

  • High Hardness: ZrB₂ is an extremely hard material, making it ideal for wear-resistant and protective coatings.
  • Thermal Stability: ZrB₂ sputtering targets produce thin films that can withstand high temperatures, making them suitable for use in harsh environments.
  • High Thermal Conductivity: ZrB₂ has excellent thermal conductivity, which is advantageous for heat management in high-performance coatings.
  • Chemical Resistance: ZrB₂ thin films are resistant to chemical attack, especially in high-temperature, corrosive environments.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Material ZrB2
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Zirconium diboride (ZrB₂) sputtering targets are used in a variety of advanced thin-film applications due to ZrB₂’s exceptional properties, including high hardness, thermal conductivity, and chemical stability. ZrB₂ is known for its use in coating technologies where durability, wear resistance, and high-temperature performance are critical.

Key Applications:

  • Protective Coatings: ZrB₂ thin films are widely used for protective coatings on tools, aerospace components, and industrial equipment due to their excellent hardness, wear resistance, and thermal stability. These coatings are beneficial in high-temperature environments such as cutting tools and turbine blades.
  • Semiconductor Devices: ZrB₂ is used in the semiconductor industry for thin-film deposition as it exhibits good electrical conductivity and high thermal stability. ZrB₂ thin films are suitable for use in microelectronics, MEMS (Micro-Electro-Mechanical Systems), and other semiconductor components that require durable, conductive coatings.
  • Aerospace and Defense: ZrB₂’s high melting point and resistance to oxidation make it suitable for use in aerospace applications, especially in ultra-high-temperature environments such as hypersonic flight vehicles and rocket engines.
  • Optical Applications: Due to its high hardness and thermal conductivity, ZrB₂ is used in optical thin-film coatings for IR optics and laser components. ZrB₂ coatings enhance the durability and performance of optical systems operating in extreme environments.
  • Superconductors: ZrB₂ has been studied for its potential in superconducting applications, particularly as a material for creating thin-film superconductors for advanced electronics and quantum computing.

Features of ZrB₂ Sputtering Targets:

  • High Hardness: ZrB₂ is an extremely hard material, making it ideal for wear-resistant and protective coatings.
  • Thermal Stability: ZrB₂ sputtering targets produce thin films that can withstand high temperatures, making them suitable for use in harsh environments.
  • High Thermal Conductivity: ZrB₂ has excellent thermal conductivity, which is advantageous for heat management in high-performance coatings.
  • Chemical Resistance: ZrB₂ thin films are resistant to chemical attack, especially in high-temperature, corrosive environments.

Customization Options:

  • Target Dimensions: ZrB₂ sputtering targets are available in a variety of sizes and shapes to meet different sputtering system requirements, including planar and rotary configurations.
  • Purity Levels: High-purity ZrB₂ targets (up to 99.9%) are available to ensure high-quality film deposition for demanding applications.
  • Doping and Alloying: ZrB₂ sputtering targets can be doped or alloyed with other materials to modify properties for specific applications such as improving electrical conductivity or oxidation resistance.

ZrB₂ (Zirconium Diboride) sputtering targets from Tinsan Materials are used for protective coatings, semiconductor devices, and aerospace applications. High-purity, customizable targets for thin-film deposition with excellent thermal and chemical stability.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.

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