Showing 205–216 of 525 results

  • GeSe2 Sputtering Target 99.9%-99.9999% High Purity Germanium Selenium Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    GeSe2 (Germanium Selenium) Sputtering Targets

    • Infrared Transparency: GeSe₂ offers excellent transmission in the infrared spectrum, making it suitable for IR optics and photonic applications.
    • Phase-Change Properties: GeSe₂ is a key material in phase-change memory technology, providing the ability to switch between different states under thermal or electrical stimuli.
    • Chemical and Thermal Stability: GeSe₂ thin films exhibit strong chemical resistance and can withstand high temperatures, ensuring longevity and performance in harsh conditions.
    • High Refractive Index: GeSe₂ has a high refractive index, making it suitable for optical applications requiring materials with specific light-bending capabilities.
  • GeTe Pellets Evaporation Material 4N-6N High Purity Germanium Telluride Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    GeTe (Germanium Telluride) Pellets Granules Evaporation Materials

    • Phase-Change Behavior: GeTe’s ability to rapidly switch between amorphous and crystalline states makes it a critical material for data storage applications, such as PCM.
    • Infrared Transparency: GeTe has good transmission in the IR range, making it ideal for infrared coatings and optics.
    • Thermoelectric Efficiency: GeTe is known for its thermoelectric properties, suitable for converting heat into electricity or vice versa.
    • High-Purity Films: When evaporated, GeTe produces high-quality, uniform thin films ideal for electronic and optical devices.
  • GH3230 Powder High Purity Nickel-based Superalloy Nanopowder Nano Powder Nanoparticles Customized - Tinsan Materials

    GH3230 Powder

    • High-Temperature Strength: Maintains excellent mechanical properties at elevated temperatures.
    • Oxidation Resistance: Outstanding performance in oxidative environments.
    • Thermal Stability: Stable microstructure under cyclic thermal conditions.
    • Corrosion Resistance: Effective against chemical and environmental corrosion.
    • Process Compatibility: Suitable for 3D printing, thermal spraying, and conventional metallurgy.
  • GZO Sputtering Targets 3N-6N High Purity Gallium-doped Zinc Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GZO (Gallium-doped Zinc Oxide) Sputtering Targets

    • Transparent Conductivity: GZO has a high optical transparency in the visible range while maintaining excellent electrical conductivity.
    • High Carrier Mobility: Gallium doping improves the carrier mobility in the Zinc Oxide structure, leading to enhanced performance in electrical applications.
    • Low Resistivity: The addition of Gallium significantly reduces the resistivity of the material, making it suitable for transparent electrodes.
    • Durability: GZO sputtering targets provide long-lasting performance in deposition processes, ensuring high-quality thin films with uniform characteristics.
    • Versatility: Suitable for both DC and RF sputtering techniques, making them versatile for different deposition equipment.
  • Hafnium Pellets Evaporation Material 3N-6N High Purity Metal Hf Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Hf Hafnium Pellets Granules Evaporation Materials

    • High Melting Point: Hafnium has a melting point of 2,233°C, making it suitable for high-temperature applications.
    • Corrosion Resistance: Hafnium is highly resistant to corrosion, particularly in aggressive environments such as halide or acidic conditions.
    • Excellent Electrical Properties: Hafnium has favorable electrical conductivity, which is valuable for its use in electronics and semiconductor manufacturing.
    • Good Neutron Absorption: Hafnium is an excellent neutron absorber, making it important for nuclear reactor control components.
    • Durable and Stable Films: Hafnium forms thin films that are hard and chemically stable, ideal for long-lasting protective coatings.
  • HfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan MaterialsHfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customize - Tinsan Materials

    HfB2 (Hafnium Diboride) Sputtering Targets

    • High Purity: Ensures reliable deposition results with minimal impurities.
    • Thermal Resistance: Outstanding stability under extreme temperatures.
    • High Hardness: Provides superior durability for wear-resistant coatings.
    • Electrical Conductivity: Suitable for conductive thin-film applications.
    • Custom Configurations: Flexible options to meet specific deposition requirements.
  • HfC Sputtering Targets 2N5-5N High Purity Hafnium Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    HfC (Hafnium Carbide) Sputtering Targets

    • High Purity: Available in purities of 99.5% or higher to ensure optimal film quality.
    • Thermal Stability: Exceptional resistance to high temperatures and thermal stress.
    • Mechanical Strength: High hardness and excellent wear resistance.
    • Oxidation Resistance: Stable in extreme environments.
  • HfN Sputtering Targets 2N5-5N High Purity Hafnium Nitride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized - Tinsan Materials

    HfN (Hafnium Nitride) Sputtering Targets

    • High Hardness: Produces durable and wear-resistant films.
    • Thermal Stability: Withstands high temperatures in extreme environments.
    • Corrosion Resistance: Ideal for chemically aggressive applications.
    • Electrical Conductivity: Offers low resistivity for electronic applications.
    • Customizable Properties: Tailored compositions and sizes to meet specific needs.
  • HfO2 Powder 2N5-5N High Purity Hafnium Dioxide Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.999% Customized - Tinsan Materials

    HfO2 (Hafnium Dioxide) Powder

    • High Thermal Stability: Hafnium Dioxide retains its strength and stability even at elevated temperatures.
    • Electrical Insulation: HfO2 is an excellent insulator, making it valuable in high-voltage applications.
    • High Refractive Index: With a refractive index of over 2, HfO2 is useful in optical coatings.
    • Corrosion Resistance: It offers strong resistance to corrosion, especially in high-temperature and aggressive environments.
    • Mechanical Strength: HfO2 powder possesses high hardness, making it suitable for wear-resistant applications.
  • HfO2 Sputtering Target 3N-6N High Purity Hafnium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsHfO2 Sputtering Target 3N-6N High Purity Hafnium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    HfO2 (Hafnium Dioxide) Sputtering Target

    • High Dielectric Constant: HfO₂ offers a high k-value, making it suitable for advanced gate dielectrics in semiconductor applications, allowing better transistor scaling.
    • Optical Transparency: HfO₂ films are transparent over a wide range of wavelengths, from UV to IR, making them ideal for optical coatings in lenses and mirrors.
    • Thermal and Chemical Stability: HfO₂ sputtering targets produce thin films with excellent resistance to high temperatures and harsh environments, ensuring durability in industrial and research applications.
    • Ferroelectric Properties: HfO₂ can exhibit ferroelectric behavior, making it crucial for non-volatile memory devices such as FeRAM.
  • HfO2 Pellets Evaporation Material 4N-6N High Purity Hafnium Oxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    HfO2 (Hafnium Oxide) Pellets Granules Evaporation Materials

    • High Dielectric Constant: HfO₂ has a high k-value (~25), making it an excellent insulator for semiconductor devices, improving their efficiency and scaling capabilities.
    • Wide Bandgap (5.3 eV): The wide bandgap of HfO₂ allows it to be used in optical devices operating in a broad range of wavelengths, especially in UV and visible spectra.
    • Thermal and Chemical Stability: Hafnium oxide exhibits exceptional resistance to heat and chemicals, making it suitable for use in harsh environments and high-temperature processes.
    • Low Absorption in the UV and Visible Range: HfO₂ thin films provide excellent optical performance with minimal absorption in UV and visible wavelengths, making them ideal for optical coatings.
    • High Refractive Index: HfO₂ has a high refractive index, beneficial for applications requiring optical coatings with high reflectivity or anti-reflection properties.
  • High Purity Alumina (Al2O3) Cylindrical Crucible - Tinsan MaterialsTinsan Materials High Purity Alumina (Al2O3) Cylindrical Crucible

    High Purity Alumina (Al2O3) Cylindrical Crucible (<100ml)

    $5.00$32.00
    • Superior thermal shock and corrosion resistance
    • Suitable for vacuum and inert environments
    • High mechanical and thermal stability
    • Available in customizable shapes and dimensions for specialized applications
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