Showing 229–240 of 526 results

  • InP Pellets Evaporation Materials 3N-7N High Purity Indium Phosphide Granules Particles for Thin Film Deposition High Pure 99.9%-99.99999% Customized - Tinsan MaterialsInP Pellets Evaporation Materials 3N-7N High Purity Indium Phosphide Granules Particles for Thin Film Deposition High Pure 99.9%-99.99999% Customize - Tinsan Materials

    InP (Indium Phosphide) Pellets Granules Evaporation Materials

    • Ultra-high purity (≥99.99%).
    • Exceptional electronic and optical properties.
    • Uniform pellet size for consistent thin-film deposition.
    • Customizable sizes and specifications.
    • Excellent thermal stability and chemical resistance.
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  • InSb Pellets Evaporation Materials 3N-7N High Purity Indium Antimonide Granules Particles for Thin Film Deposition High Pure 99.9%-99.99999% Customized - Tinsan Materials

    InSb (Indium Antimonide) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Excellent infrared absorption and thermoelectric properties.
    • Stable and reliable for thin-film deposition processes.
    • Uniform pellet size for consistent evaporation and vaporization.
    • Custom sizes and compositions available to meet specific needs.
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  • InSb Sputtering Targets 3N-7N High Purity Indium Antimonide Ceramic Sputtering Target High Pure 99.9%-99.99999% Customized for Thin Film Deposition - Tinsan MaterialsInSb Sputtering Targets 3N-7N High Purity Indium Antimonide Ceramic Sputtering Target High Pure 99.9%-99.99999% Customize for Thin Film Deposition - Tinsan Materials

    InSb (Indium Antimonide) Sputtering Targets

    • High Purity: Ensures minimal contamination during deposition processes.
    • Excellent Infrared Performance: Optimal for devices requiring sensitivity in the infrared spectrum.
    • Uniform Film Deposition: Supports consistent and reliable thin-film production.
    • Customizable Options: Tailored shapes, sizes, and purity levels to meet specific project requirements.
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  • Ir Pellets Evaporation Materials 3N-6N High Purity Metal Iridium Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Ir Iridium Pellets Granules Evaporation Materials

    • Ultra-high purity (≥99.9%).
    • Exceptional thermal and chemical stability.
    • Excellent corrosion resistance and electrical conductivity.
    • Uniform pellet size for consistent deposition rates.
    • Customizable sizes and compositions to meet specific needs.
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  • Iridium Sputtering Target 99.9%-99.9999% High Purity Ir Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsIridium Sputtering Target 99.9%-99.9999% High Purity Ir Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Ir Iridium Sputtering Target

    • High Purity: Iridium sputtering targets are available in ultra-high purity (up to 99.99%) to ensure the deposition of superior thin films for sensitive electronics and optical components.
    • Thermal Stability: Iridium’s high melting point (~2446°C) makes it ideal for thin films that must withstand extreme heat in aerospace, semiconductor, and other high-temperature environments.
    • Corrosion Resistance: Iridium is one of the most corrosion-resistant metals, ensuring long-lasting films in harsh chemical environments.
    • Electrical Conductivity: Iridium thin films offer excellent electrical conductivity, making them essential for electronic applications requiring efficient current flow.
    • Customizable Size and Shape: Available in various forms, including discs, plates, and custom geometries, to fit different PVD systems.
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  • IrMn Alloy Target 99.9%-99.9999% High Purity Iridium Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    IrMn (Iridium Manganese) Alloy Target

    • Antiferromagnetic Properties: IrMn alloy thin films exhibit strong antiferromagnetic behavior, which is essential for magnetic pinning in spintronic devices and memory storage.
    • High Corrosion Resistance: Iridium provides excellent corrosion resistance, ensuring the durability and longevity of the deposited thin films, even in harsh environments.
    • Thermal Stability: IrMn alloy films are thermally stable, making them ideal for high-temperature applications in electronic and magnetic devices.
    • Customizable Size and Shape: IrMn sputtering targets are available in various sizes and shapes, including discs, plates, and custom geometries, to suit a wide range of deposition systems.
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  • ITO Pellets Evaporation Material 4N-6N High Purity Indium Tin Oxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    ITO (Indium Tin Oxide) Pellets Granules Evaporation Materials

    $100.00 – $780.00
    • High Electrical Conductivity: ITO films exhibit excellent electrical conductivity, allowing for efficient electron transport in devices like displays, sensors, and solar cells.
    • Optical Transparency: ITO combines electrical conductivity with high transparency in the visible spectrum, making it essential for devices that require a clear view, such as displays and touchscreens.
    • Wide Bandgap (3.5-4.3 eV): The wide bandgap of ITO makes it suitable for transparent conducting electrodes, ensuring minimal interference with visible light.
    • Durability: ITO coatings are robust and can withstand environmental stress, including UV exposure and high temperatures, ensuring long-lasting performance.
    • Customizable Conductivity and Transparency: The ratio of indium to tin can be adjusted to optimize the balance between conductivity and transparency based on the specific application needs.
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  • ITO Sputtering Target 3N-7N High Purity Indium Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan MaterialsITO Sputtering Target 3N-7N High Purity Indium Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    ITO (Indium Tin Oxide) Sputtering Target

    • High Transparency and Conductivity: ITO offers a balance of excellent transparency in the visible spectrum and good electrical conductivity, making it a perfect material for applications requiring both.
    • Adjustable Stoichiometry: The ratio of In2O3 to SnO2 in ITO can be adjusted to optimize its electrical and optical properties for specific applications.
    • Thin-film Uniformity: ITO films are known for their uniform thickness and quality, essential for ensuring consistent performance across large-area coatings like touchscreens and solar panels.
    • Durability: ITO films are chemically stable and durable, providing long-term performance in various environmental conditions.
    • Custom Purity Levels: ITO sputtering targets are available in a variety of purities (up to 99.999%) to meet the stringent requirements of high-performance electronic and optical devices.
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  • IWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan MaterialsIWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    IWO (Indium Tungsten Oxide) Sputtering Targets

    • High Optical Transparency: Enables the creation of efficient transparent films.
    • Superior Conductivity: Provides excellent electrical performance for electronic applications.
    • Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
    • Customizable Material Composition: Optimized for specific TCO requirements.
    • Compatibility: Suitable for RF and DC sputtering systems.
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  • Lanthanum Sputtering Target 99.9%-99.9999% High Purity La Metal Sputtering Targets 3N-6N CustomizedLanthanum Sputtering Target 99.9%-99.9999% High Purity La Metal Sputtering Targets 3N-6N Customized

    La Lanthanum Sputtering Target

    Lanthanum sputtering targets are crucial for creating thin films with specific electronic, optical, and catalytic properties, making them valuable in advanced technologies such as semiconductors, optics, superconductors, and energy storage systems. Despite its reactivity, lanthanum’s unique characteristics provide significant advantages in various high-tech industrial and scientific applications.

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  • La2O3 Pellets Evaporation Material 3N-6N High Purity Lanthanum Oxide Granules Particles for Coating High Pure 99.9%-99.9999% Customize - Tinsan MaterialsLa2O3 Pellets Evaporation Material 3N-6N High Purity Lanthanum Oxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized From Tinsan Materials

    La2O3 (Lanthanum Oxide) Pellets Granules Evaporation Materials

    • High Refractive Index: La₂O₃ has one of the highest refractive indices among the oxides, making it highly suitable for optical applications where precise light manipulation is required.
    • Excellent Dielectric Properties: It has a high dielectric constant, which is beneficial for use in electronic devices and capacitors.
    • Infrared Transparency: La₂O₃ is transparent in the infrared spectrum, which makes it an ideal material for infrared optics and laser applications.
    • High Purity: The high purity of La₂O₃ pellets ensures the production of high-quality thin films with minimal contamination.
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  • La2O3 Sputtering Target 3N-6N High Purity Lanthanum Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    La2O3 (Lanthanum Oxide) Sputtering Target

    • High Dielectric Constant: La₂O₃ exhibits a high dielectric constant, making it an excellent material for advanced electronic components, such as gate dielectrics in MOSFETs.
    • High Refractive Index: Its high refractive index makes it ideal for enhancing optical properties in coatings for lenses, filters, and other precision optical devices.
    • Thermal and Chemical Stability: La₂O₃ is highly stable under extreme temperatures and chemically resistant, making it suitable for high-performance applications.
    • Catalytic Efficiency: Lanthanum oxide’s catalytic properties are leveraged in thin films used for environmental and energy applications.
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