Showing 397–408 of 525 results

  • SnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SnSe2 (Tin Diselenide) Sputtering Targets

    • High Purity: ≥ 99.99% purity ensures consistent and efficient thin-film deposition.
    • Layered Structure: Promotes easy exfoliation and high-quality thin-film production.
    • Exceptional Optical and Electrical Properties: High carrier mobility and excellent absorption coefficients.
    • Thermoelectric Efficiency: Strong performance in thermal-to-electric energy conversion.
    • Customizable Options: Tailored sizes and shapes to suit diverse applications.
  • SnTe Pellets Evaporation Materials 3N-6N High Purity Tin Telluride Granules Particles High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSnTe Pellets Evaporation Materials 3N-6N High Purity Tin Telluride Granules Particles High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SnTe (Tin Telluride) Pellets Granules Evaporation Materials

    • Thermoelectric Efficiency: Outstanding thermoelectric performance with a high Seebeck coefficient and low thermal conductivity.
    • Optoelectronic Properties: High carrier mobility and sensitivity to infrared light.
    • Customizable Sizes: Tailored particle sizes for various research and industrial needs.
    • Stable Crystal Structure: Rock-salt (NaCl-type) structure for robust stability.
    • High Purity: Ultra-pure material for precise and repeatable results.
  • SnTe Sputtering Targets 2N5-6N High Purity Tin Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SnTe (Tin Telluride) Sputtering Targets

    • High Purity: Reduces impurities, ensuring superior thin-film quality.
    • Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
    • Excellent Film Properties: Produces smooth, high-density, and defect-free films.
    • Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
    • Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
  • Sr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsSr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    Sr3Al2O6 (Strontium Aluminate) Sputtering Targets

    • Thermal Stability: Sr₃Al₂O₆ sputtering targets exhibit excellent thermal stability, making them suitable for high-temperature deposition processes.
    • Durability: The material provides strong, durable films that are resistant to wear and tear, enhancing the longevity of devices.
    • High Luminescent Properties: When doped with certain elements, it can act as a phosphorescent material, making it valuable in the display and lighting industries.
    • Versatile Film Properties: It can produce films with excellent uniformity and precise thickness control in sputtering processes.
    • Chemical Resistance: Sr₃Al₂O₆ is chemically stable, contributing to the robustness of coatings and films.
  • SrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SrCoO3 (Strontium Cobalt Oxide) Sputtering Targets

    • Excellent Electrical Conductivity: Ensures efficient charge transfer in energy devices.
    • Thermal and Chemical Stability: Performs reliably under high-temperature and reactive conditions.
    • High Purity Material: Minimizes impurities for optimal film quality.
    • Versatile Applications: Suitable for complex oxide-based thin-film devices.
    • Customizable Configurations: Various sizes, purities, and bonding options to meet specific requirements.
  • SrMnO3 Sputtering Targets 3N-6N High Purity Strontium Manganite Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrMnO3 (Strontium Manganite) Sputtering Targets

    • High Purity: Ensures low contamination and high film integrity.
    • Superior Density: Achieves consistent sputtering performance and uniform thin films.
    • Customizable Specifications: Available in various sizes, shapes, and densities.
    • Excellent Thermal Stability: Withstands high temperatures for advanced applications.
    • Wide Compatibility: Suitable for different sputtering systems.
  • SrMoO4 (Strontium Molybdate) Sputtering Targets

    • High Purity: Ensures minimal contamination in the deposited thin films.
    • Chemical Stability: Offers long-lasting performance in demanding environments.
    • Customizable: Available in various sizes, shapes, and thicknesses to meet specific requirements.
    • Consistent Quality: Designed for uniform film deposition with optimal density and microstructure.
  • SrNbO3 (Strontium Niobate) Sputtering Targets

    • High Purity: Manufactured with stringent quality controls to ensure material integrity and minimal impurities.
    • Customizable Options: Available in various sizes, thicknesses, and shapes to meet specific deposition requirements.
    • Excellent Physical Properties: Offers reliable electrical and optical performance.
    • Versatile Compatibility: Suitable for advanced sputtering systems.
  • SrRuO3 Sputtering Targets 3N-6N High Purity Strontium Ruthenate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrRuO3 (Strontium Ruthenate) Sputtering Targets

    • High Electrical Conductivity: SrRuO₃ films provide excellent electrical conductivity, making them ideal for use as electrodes and contact layers.
    • Stability: Offers good stability under various operating conditions, making it suitable for use in demanding applications.
    • Magnetic Properties: Exhibits magnetic properties, making it useful in devices that require the integration of magnetic and electronic functions.
    • Compatible with Other Oxides: SrRuO₃ can be easily integrated with other perovskite oxide materials, making it versatile for various electronic applications.
    • High Purity: Available in high-purity grades (≥99.9%) to ensure clean and consistent thin-film deposition.
  • SrSnO3 Sputtering Targets 3N-6N High Purity Strontium Stannate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrSnO3 (Strontium Stannate) Sputtering Targets

    • High Purity: Ensures superior film quality and uniform deposition.
    • Optimal Conductivity: Suitable for advanced optoelectronic devices.
    • Customization: Available in various sizes, shapes, and compositions to meet specific requirements.
    • Stability: Excellent thermal and chemical stability for long-lasting performance.
  • SrTiO3 Pellets Evaporation Materials 3N-6N High Purity Strontium Titanate Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSrTiO3 Pellets Evaporation Materials 3N-6N High Purity Strontium Titanate Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SrTiO3 (Strontium Titanate) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Excellent dielectric and optical properties.
    • Uniform pellet size for precise thin-film deposition.
    • Customizable sizes and specifications.
    • High thermal stability and chemical resistance.
  • SrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan MaterialsSrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrTiO3 (Strontium Titanate) Sputtering Targets

    • High Purity: Typically ≥99.9% for superior film quality and performance
    • Excellent Dielectric Properties: Ideal for high-frequency electronic applications
    • Perovskite Structure: Ensures compatibility with complex oxide thin films
    • Customizable: Available in various sizes and shapes to suit specific requirements
    • Durability: High thermal and chemical stability for long-term use