Showing 445–456 of 525 results
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- High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
- Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
- Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
- Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
- Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.
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- High purity (≥99.9% or ≥99.99%).
- Excellent thermal and chemical stability.
- Uniform pellet size for consistent performance.
- Customizable specifications tailored to specific requirements.
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- High Purity: Ensures superior film quality and minimal contamination.
- Stable Properties: Excellent thermal and chemical stability under deposition conditions.
- Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
- Versatile Performance: Suitable for a wide range of thin-film applications.
- Durability: High mechanical strength for extended usability.
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- High Refractive Index: Offers superior refractive index properties, making it ideal for optical coatings and enhancing light manipulation in optical devices.
- Broad Transparency Range: Transmits well in the UV, visible, and IR ranges, allowing for applications across a wide spectrum of light.
- Excellent Hardness and Stability: TiO₂ is chemically inert and provides good hardness, which makes it ideal for durable coatings.
- Photocatalytic Activity: Exhibits high efficiency in photocatalytic reactions under UV light, useful in environmental cleanup and antibacterial coatings.
- High Dielectric Constant: Enables its use in microelectronics for creating high-performance dielectric layers in capacitors and transistors.
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- High Refractive Index: TiO₂ has one of the highest refractive indices among dielectric materials, making it ideal for optical coatings that require light management.
- Photocatalytic Activity: TiO₂ is highly effective as a photocatalyst, breaking down organic compounds and providing self-cleaning or environmental purification functions.
- High Dielectric Constant: TiO₂’s excellent dielectric properties make it useful in capacitors and other semiconductor applications requiring stable, insulating layers.
- Thermal and Chemical Stability: TiO₂ films are stable under high temperatures and resistant to chemical attack, which is important for robust and long-lasting coatings.
- UV Absorption: TiO₂ effectively absorbs UV light, making it suitable for applications in UV-blocking coatings or as a protective layer in various devices.
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- High Purity: Ensures consistent film quality and reduces defects in deposited layers.
- Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
- Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
- Customizable Options: Available in various compositions and dimensions to meet specific requirements.
- Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
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- High Electrical Conductivity: Enables efficient current flow in thin films.
- Thermal Stability: Performs well under high-temperature conditions.
- High Purity: Ensures minimal impurities for precise and reliable deposition.
- Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
- Customizable Specifications: Tailored to meet the demands of diverse applications.
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- High Purity: Ensures optimal film quality and performance.
- Excellent Electrical Conductivity: Suitable for advanced electronic applications.
- Thermal Stability: Resilient under high-temperature deposition processes.
- Layered Structure: Ideal for 2D material synthesis and related technologies.
- Customizable Specifications: Available in tailored sizes, shapes, and configurations.
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- Superior Mechanical Strength: The combination of titanium, zirconium, hafnium, and niobium results in exceptional mechanical strength, making TiZrHfNb thin films suitable for applications exposed to extreme stress and high temperatures.
- High Corrosion Resistance: This alloy’s ability to resist oxidation and corrosion, particularly in harsh and high-temperature environments, makes it ideal for aerospace, energy, and medical applications.
- Thermal Stability: TiZrHfNb alloy thin films retain their structural integrity at elevated temperatures, making them suitable for use in high-heat applications, such as power generation systems and aerospace components.
- Wear Resistance: The combination of hafnium and niobium in the alloy enhances wear resistance, making it perfect for applications requiring durable coatings, such as industrial tools and mechanical parts.
- Biocompatibility: TiZrHfNb alloy is biocompatible, making it ideal for medical devices and implants where long-term stability and resistance to body fluids are required.
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- Exceptional Mechanical Properties: Outstanding strength and ductility even at high temperatures.
- High-Temperature Stability: Retains structural integrity under extreme thermal conditions.
- Corrosion and Oxidation Resistance: Suitable for harsh and reactive environments.
- High Entropy Alloy: Unique multi-element composition for enhanced material performance.
- Customizable Particle Sizes: Nano to micrometer scales for diverse applications.
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- High purity (≥99.9%).
- Excellent thermal stability and chemical resistance.
- Superior optical properties for laser and optical coatings.
- Uniform pellet size for consistent deposition results.
- Customizable to meet specific application requirements.
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- High Purity: Ensures optimal performance and low impurity levels in thin films.
- Exceptional Optical Properties: Ideal for laser and photonic applications.
- Thermal Stability: Suitable for high-temperature processes.
- Customizable Specifications: Adaptable to diverse application needs.
- Compatibility: Works with various sputtering systems, including RF and DC.
