Showing 457–468 of 525 results

  • Tm3Fe5O12 Sputtering Targets 2N5-6N High Purity Thulium Iron Garnet Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets

    • High Purity: Ensures minimal contamination for superior thin-film properties.
    • Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
    • Magnetic and Optical Excellence: Delivers high-performance film characteristics.
    • Robust Performance: Supports a wide range of deposition techniques.
    • Customizable Options: Tailored specifications for diverse deposition systems.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Tungsten Trioxide (WO3) Sputtering Targets

    • High Purity: Ensures consistent film quality and performance.
    • Customizable Dimensions: Available in a variety of sizes and shapes to meet specific requirements.
    • Excellent Durability: Suitable for high-temperature and high-power sputtering processes.
    • Uniformity: Enables consistent thin-film deposition for advanced technologies.
    • Eco-Friendly Applications: Ideal for energy-efficient devices like smart windows.
  • Tungsten W Evaporation Boats - Tinsan MaterialsTungsten Evaporation Boats - Tinsan Materials

    Tungsten W Evaporation Boats

    • Long lifespan due to exceptional wear resistance.
    • Customizable design for specific applications.
    • High purity ensures minimal contamination in sensitive processes.
    • Suitable for both batch production and R&D applications.
  • Vanadium Pellets Evaporation Material 3N-6N High Purity Metal V Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V Vanadium Pellets Granules Evaporation Materials

    • High Strength & Corrosion Resistance: Vanadium offers excellent durability, making it suitable for applications in extreme environments.
    • High Purity: Available in high-purity forms (≥ 99.9%) for optimal thin film deposition with minimal contamination.
    • Good Evaporation Properties: Vanadium has a melting point of 1910°C, allowing efficient vapor deposition in high-temperature processes.
    • Versatile Application Range: Used in various fields such as electronics, optics, and renewable energy storage, making it a versatile evaporation material.
  • V Vanadium Powder 2N5-5N High Purity Vanadium Nanopowder Metal Nano Powder Nanoparticles High Pure 99.5%-99.999% Customized - Tinsan Materials

    V Vanadium Powder

    • High Purity: Ensures superior performance in demanding applications.
    • Corrosion Resistance: Resists oxidation and degradation in harsh environments.
    • High Strength-to-Weight Ratio: Lightweight yet strong, ideal for aerospace and structural applications.
    • Thermal and Electrical Conductivity: Efficient in thermal and electrical energy management.
    • Customizable Particle Sizes: Adaptable to specific industrial requirements.
  • Vanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets CustomizedVanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets Customized

    V Vanadium Sputtering Target

    Vanadium sputtering targets are essential in industries that require strong, corrosion-resistant, and stable thin films. Their use in semiconductors, aerospace, superconducting materials, and energy storage highlights the versatility and importance of vanadium in advanced technology applications.

  • V2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsV2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V2O5 (Vanadium Pentoxide) Sputtering Target

    • Electrochromic Properties: V₂O₅ is a well-known electrochromic material, enabling the dynamic control of optical properties in thin films.
    • High Oxidation State: Vanadium pentoxide has a high oxidation state, which enhances its catalytic and electrochemical performance in various applications.
    • Thermal Stability: V₂O₅ is stable at high temperatures, making it suitable for thin-film applications that require resistance to heat.
    • Multifunctional: V₂O₅ is versatile and can be used in applications ranging from energy storage to optical and gas-sensing devices.
  • VAl Particles Evaporation Material 2N-6N High Purity Vanadium Aluminum Granules Pellets for Coating High Pure 99%-99.9999% Customized - Tinsan Materials

    VAl (Vanadium Aluminum) Pellets 6N (99.9999%) Granules Evaporation Materials

    • Lightweight: Offers a lower density compared to pure metals, ideal for weight-sensitive applications.
    • High Strength: Provides robust mechanical properties, suitable for demanding environments.
    • Corrosion Resistance: Exhibits good resistance to oxidation, enhancing the longevity of coated materials.
  • VC Sputtering Targets 2N5-6N High Purity Vanadium Carbide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Carbide (VC) Sputtering Targets

    • Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
    • Chemical Stability: Maintains performance in harsh and reactive environments.
    • High Thermal Conductivity: Efficiently dissipates heat in critical applications.
    • Uniform Deposition: Ensures consistent film quality with minimal defects.
    • Customizable Options: Available in various sizes and purities for specialized applications.
  • VN Sputtering Targets 3N-6N High Purity Vanadium Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Nitride (VN) Sputtering Targets

    • High hardness and wear resistance, ideal for demanding environments
    • Excellent corrosion resistance, prolonging the life of components
    • Stable and consistent film quality for precise deposition
    • Suitable for high-temperature and high-performance applications
    • Enhanced durability in harsh operational conditions
    • Compatible with various sputtering systems and deposition techniques
  • VB2 Sputtering Targets 2N5-6N High Purity Vanadium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VB2 (Vanadium Diboride) Sputtering Targets

    • Exceptional Hardness: VB₂ coatings provide unmatched surface durability and wear resistance.
    • High Electrical Conductivity: Ensures efficient conductivity for electronic applications.
    • Thermal Stability: Retains structural integrity under high-temperature conditions, making it suitable for extreme environments.
    • Chemical Stability: Resists corrosion in aggressive chemical and environmental conditions.
    • Customizable Dimensions: Tailored to specific application needs with a range of sizes and shapes available.
  • VC Powder 2N5-6N High Purity Vanadium Carbide Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.9999% Customized - Tinsan Materials

    VC (Vanadium Carbide) Powder

    • High Hardness: Vanadium Carbide is one of the hardest materials, providing outstanding wear resistance.
    • High Melting Point: Boasts a high melting point of approximately 2,750°C, making it suitable for extreme temperature environments.
    • Chemical Stability: Excellent resistance to corrosion and oxidation, ensuring longevity and durability in harsh environments.
    • Wear Resistance: Ideal for applications involving high friction and wear.
    • Customizable Particle Size: Available in various grades and particle sizes to meet specific customer needs.