Showing 529–540 of 632 results

  • TiN Pellets Evaporation Material 3N-6N High Purity Titanium Nitride Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TiN (Titanium Nitride) Pellets Granules Evaporation Materials

    • High Hardness: TiN is extremely hard and resistant to wear, making it ideal for protective coatings in industrial applications.
    • Chemical Stability: TiN is chemically inert and resistant to corrosion, which ensures durability in harsh environments.
    • Golden Appearance: Its distinct golden color makes it a popular choice for decorative coatings.
    • High Thermal Conductivity: TiN exhibits good thermal stability, making it suitable for high-temperature applications.
    • Electrical Conductivity: TiN thin films are electrically conductive, making them useful in electronic and semiconductor applications.
  • TiN Powder 2N5-5N High Purity Titanium Nitride Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.999% Customized - Tinsan Materials

    TiN (Titanium Nitride) Powder

    • Hardness: Titanium Nitride has a high hardness level, making it ideal for wear-resistant applications.
    • Corrosion Resistance: Exceptional resistance to oxidation and corrosion, extending the lifespan of components.
    • High Thermal Stability: TiN maintains its stability even at high temperatures, making it suitable for high-temperature applications.
    • Versatility: Can be used as a coating material or as a raw material for composites.
    • Biocompatibility: Non-toxic and biocompatible, suitable for certain medical and biomedical applications.
  • TiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiN (Titanium Nitride) Sputtering Target

    • High Hardness: TiN coatings are known for their exceptional hardness, making them ideal for cutting tools and components subject to high friction and stress.
    • Corrosion Resistance: TiN provides excellent protection against corrosion and oxidation, extending the lifespan of coated parts and tools.
    • High Temperature Stability: TiN remains stable at high temperatures, making it suitable for applications in high-temperature environments such as aerospace or industrial machinery.
    • Good Electrical Conductivity: TiN is conductive and is often used in microelectronics as a barrier or adhesion layer in integrated circuits.
    • Gold-Like Appearance: TiN has a bright gold color, making it popular for decorative applications and coatings in architectural elements and consumer products.
  • SnS Sputtering Targets 3N-6N High Purity Tin Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Tin Sulfide (SnS) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
    • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
    • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
    • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.
  • TiO Pellets Evaporation Materials 3N-6N High Purity Titanium Monoxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTiO Pellets Evaporation Materials 3N-6N High Purity Titanium Monoxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    TiO (Titanium Monoxide) Pellets Granules Evaporation Materials

    • High purity (≥99.9% or ≥99.99%).
    • Excellent thermal and chemical stability.
    • Uniform pellet size for consistent performance.
    • Customizable specifications tailored to specific requirements.
  • TiO Sputtering Targets 2N5-6N High Purity Titanium Monoxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    TiO (Titanium Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and minimal contamination.
    • Stable Properties: Excellent thermal and chemical stability under deposition conditions.
    • Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
    • Versatile Performance: Suitable for a wide range of thin-film applications.
    • Durability: High mechanical strength for extended usability.
  • TiO2 Pellets Evaporation Material 4N-6N High Purity Titanium Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    TiO2 (Titanium Dioxide) Pellets Granules Evaporation Materials

    • High Refractive Index: Offers superior refractive index properties, making it ideal for optical coatings and enhancing light manipulation in optical devices.
    • Broad Transparency Range: Transmits well in the UV, visible, and IR ranges, allowing for applications across a wide spectrum of light.
    • Excellent Hardness and Stability: TiO₂ is chemically inert and provides good hardness, which makes it ideal for durable coatings.
    • Photocatalytic Activity: Exhibits high efficiency in photocatalytic reactions under UV light, useful in environmental cleanup and antibacterial coatings.
    • High Dielectric Constant: Enables its use in microelectronics for creating high-performance dielectric layers in capacitors and transistors.
  • TiO2 Powder 3N-6N High Purity Titanium Dioxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TiO2 (Titanium Dioxide) Powder

    • High Purity: Ensures superior performance across diverse applications.
    • Excellent Photocatalytic Properties: Effective for environmental purification and self-cleaning surfaces.
    • High Refractive Index: Ideal for optical coatings and pigments.
    • UV Protection: Provides exceptional UV absorption for sunscreens and protective coatings.
    • Thermal Stability: Performs consistently in high-temperature environments.
    • Customizable Particle Size: Available in nano and micron sizes tailored to specific requirements.
  • TiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiO2 (Titanium Dioxide) Sputtering Target

    • High Refractive Index: TiO₂ has one of the highest refractive indices among dielectric materials, making it ideal for optical coatings that require light management.
    • Photocatalytic Activity: TiO₂ is highly effective as a photocatalyst, breaking down organic compounds and providing self-cleaning or environmental purification functions.
    • High Dielectric Constant: TiO₂’s excellent dielectric properties make it useful in capacitors and other semiconductor applications requiring stable, insulating layers.
    • Thermal and Chemical Stability: TiO₂ films are stable under high temperatures and resistant to chemical attack, which is important for robust and long-lasting coatings.
    • UV Absorption: TiO₂ effectively absorbs UV light, making it suitable for applications in UV-blocking coatings or as a protective layer in various devices.
  • TiSb Sputtering Targets 99.5%-99.9999% High Purity Titanium Antimony Alloy Sputtering Target 2N5-6N Customized - Tinsan Materials

    TiSb (Titanium Antimony) Sputtering Targets

    • High Purity: Ensures consistent film quality and reduces defects in deposited layers.
    • Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
    • Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
    • Customizable Options: Available in various compositions and dimensions to meet specific requirements.
    • Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
  • TiTe2 Sputtering Targets 3N-6N High Purity Titanium Ditelluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    TiTe2 (Titanium Ditelluride) Sputtering Targets

    • High Purity: Ensures optimal film quality and performance.
    • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
    • Thermal Stability: Resilient under high-temperature deposition processes.
    • Layered Structure: Ideal for 2D material synthesis and related technologies.
    • Customizable Specifications: Available in tailored sizes, shapes, and configurations.