Showing 541–552 of 632 results

  • TiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsTiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    TiZrHfNb (Titanium Zirconium Hafnium Niobium) Alloy Target

    • Superior Mechanical Strength: The combination of titanium, zirconium, hafnium, and niobium results in exceptional mechanical strength, making TiZrHfNb thin films suitable for applications exposed to extreme stress and high temperatures.
    • High Corrosion Resistance: This alloy’s ability to resist oxidation and corrosion, particularly in harsh and high-temperature environments, makes it ideal for aerospace, energy, and medical applications.
    • Thermal Stability: TiZrHfNb alloy thin films retain their structural integrity at elevated temperatures, making them suitable for use in high-heat applications, such as power generation systems and aerospace components.
    • Wear Resistance: The combination of hafnium and niobium in the alloy enhances wear resistance, making it perfect for applications requiring durable coatings, such as industrial tools and mechanical parts.
    • Biocompatibility: TiZrHfNb alloy is biocompatible, making it ideal for medical devices and implants where long-term stability and resistance to body fluids are required.
  • TiZrHfNbTa Pellets Evaporation Materials 2N-4N High Purity Titanium Zirconium Hafnium Niobium Tantalum Granules High Entropy Alloy (HEA) Particles High Pure 99%-99.99% CustomizedTiZrHfNbTa Pellets Evaporation Materials 2N-4N High Purity Titanium Zirconium Hafnium Niobium Tantalum Granules High Entropy Alloy (HEA) Particles High Pure 99%-99.99% Customize

    TiZrHfNbTa (Titanium Zirconium Hafnium Niobium Tantalum) Pellets Granules Evaporation Materials

    • Exceptional Mechanical Properties: Outstanding strength and ductility even at high temperatures.
    • High-Temperature Stability: Retains structural integrity under extreme thermal conditions.
    • Corrosion and Oxidation Resistance: Suitable for harsh and reactive environments.
    • High Entropy Alloy: Unique multi-element composition for enhanced material performance.
    • Customizable Particle Sizes: Nano to micrometer scales for diverse applications.
  • Tm2O3 Pellets Evaporation Materials 3N-6N High Purity Thulium Oxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Tm2O3 (Thulium Oxide) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Excellent thermal stability and chemical resistance.
    • Superior optical properties for laser and optical coatings.
    • Uniform pellet size for consistent deposition results.
    • Customizable to meet specific application requirements.
  • Tm2O3 Powder 3N-5N High Purity Thulium Oxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    Tm2O3 (Thulium Oxide) Powder

    • High Purity: ≥99.99% (4N), ensuring consistent performance.
    • Unique Optical Properties: Suitable for laser and phosphor applications.
    • Thermal Stability: High melting point and excellent thermal resistance.
    • Chemical Stability: Resistant to oxidation and corrosion.
    • Customizable Particle Sizes: Available in nano and micron grades.
    • Versatility: Supports a wide range of industrial and research applications.
  • Tm2O3 Sputtering Targets 3N-6N High Purity Thulium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Tm2O3 (Thulium Oxide) Sputtering Targets

    • High Purity: Ensures optimal performance and low impurity levels in thin films.
    • Exceptional Optical Properties: Ideal for laser and photonic applications.
    • Thermal Stability: Suitable for high-temperature processes.
    • Customizable Specifications: Adaptable to diverse application needs.
    • Compatibility: Works with various sputtering systems, including RF and DC.
  • Tm3Fe5O12 Sputtering Targets 2N5-6N High Purity Thulium Iron Garnet Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets

    • High Purity: Ensures minimal contamination for superior thin-film properties.
    • Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
    • Magnetic and Optical Excellence: Delivers high-performance film characteristics.
    • Robust Performance: Supports a wide range of deposition techniques.
    • Customizable Options: Tailored specifications for diverse deposition systems.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Tungsten Trioxide (WO3) Sputtering Targets

    • High Purity: Ensures consistent film quality and performance.
    • Customizable Dimensions: Available in a variety of sizes and shapes to meet specific requirements.
    • Excellent Durability: Suitable for high-temperature and high-power sputtering processes.
    • Uniformity: Enables consistent thin-film deposition for advanced technologies.
    • Eco-Friendly Applications: Ideal for energy-efficient devices like smart windows.
  • Tungsten W Evaporation Boats - Tinsan MaterialsTungsten Evaporation Boats - Tinsan Materials

    Tungsten W Evaporation Boats

    • Long lifespan due to exceptional wear resistance.
    • Customizable design for specific applications.
    • High purity ensures minimal contamination in sensitive processes.
    • Suitable for both batch production and R&D applications.
  • V Vanadium Foil - Tinsan Materials

    V Vanadium Foil

    • High Strength-to-Weight Ratio: Vanadium foil is lightweight yet incredibly strong, making it suitable for aerospace and structural applications.
    • Corrosion Resistance: Vanadium exhibits excellent resistance to oxidation and corrosion, especially in harsh environments.
    • High Melting Point: With a melting point of 1,910°C (3,470°F), vanadium foil is highly resistant to heat, ideal for high-temperature applications.
    • Ductility: Vanadium foil is ductile and can be processed into thin sheets or complex shapes without losing its structural integrity.
    • Thermal and Electrical Conductivity: Vanadium offers good thermal and electrical conductivity, suitable for energy storage and electrical applications.
    • Compatibility with Alloys: Vanadium can enhance the strength and wear resistance of other metals when used as an alloying element.
  • Vanadium Pellets Evaporation Material 3N-6N High Purity Metal V Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V Vanadium Pellets Granules Evaporation Materials

    • High Strength & Corrosion Resistance: Vanadium offers excellent durability, making it suitable for applications in extreme environments.
    • High Purity: Available in high-purity forms (≥ 99.9%) for optimal thin film deposition with minimal contamination.
    • Good Evaporation Properties: Vanadium has a melting point of 1910°C, allowing efficient vapor deposition in high-temperature processes.
    • Versatile Application Range: Used in various fields such as electronics, optics, and renewable energy storage, making it a versatile evaporation material.
  • V Vanadium Powder 2N5-5N High Purity Vanadium Nanopowder Metal Nano Powder Nanoparticles High Pure 99.5%-99.999% Customized - Tinsan Materials

    V Vanadium Powder

    • High Purity: Ensures superior performance in demanding applications.
    • Corrosion Resistance: Resists oxidation and degradation in harsh environments.
    • High Strength-to-Weight Ratio: Lightweight yet strong, ideal for aerospace and structural applications.
    • Thermal and Electrical Conductivity: Efficient in thermal and electrical energy management.
    • Customizable Particle Sizes: Adaptable to specific industrial requirements.
  • Vanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets CustomizedVanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets Customized

    V Vanadium Sputtering Target

    Vanadium sputtering targets are essential in industries that require strong, corrosion-resistant, and stable thin films. Their use in semiconductors, aerospace, superconducting materials, and energy storage highlights the versatility and importance of vanadium in advanced technology applications.