Showing 49–60 of 632 results

  • High Purity Au Gold Sputtering Target 99.99%-99.999% Plate Gold 4N-5N Round Gold for Magnetron CoatingHigh Purity Au Gold Sputtering Target 99.99%-99.999% Plate Gold 4N-5N

    Au Gold Sputtering Target

    Gold (Au) sputtering target is a very important material of semiconductor, it’s used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.

  • Au Gold Wire - Tinsan Materials

    Au Gold Wire

    • Reliability in Electronic Applications: Gold wire is known for its reliability, especially in wire bonding used for semiconductor devices and microelectronics. The high resistance to corrosion ensures that the connections remain intact over time, even under extreme conditions.
    • Long Service Life: Due to its resistance to corrosion and wear, gold wire has a long operational life, reducing the need for frequent replacements or repairs.
    • Precision and Flexibility: Gold wire can be produced in various diameters, including ultra-fine wires, making it highly versatile for different manufacturing processes. Its malleability allows it to be shaped and adapted for precision applications.
    • Improved Performance: With its superior conductivity and resistance to corrosion, gold wire ensures better performance and higher yield rates in electronic assemblies, reducing the risk of failures due to poor electrical connections.
  • AuSn Pellets Evaporation Materials 3N-5N High Purity Gold Tin Alloy Granules Particles High Pure 99.9%-99.999% Customized - Tinsan Materials

    AuSn (Gold Tin) Pellets Granules Evaporation Materials

    • Excellent Soldering Properties: Ideal for bonding and joining materials in microelectronics.
    • High Thermal and Electrical Conductivity: Ensures efficient heat dissipation and electrical performance.
    • Corrosion Resistance: Offers longevity and stability under harsh conditions.
    • Stable at High Temperatures: Suitable for high-temperature soldering and welding applications.
    • Customizable Sizes: Available in nano to micrometer scale for various uses.
  • AZO Pellets Evaporation Material 3N-6N High Purity Aluminum-Doped Zinc Oxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    AZO (Aluminum-Doped Zinc Oxide) Pellets Granules Evaporation Materials

    $40.00$320.00
    • Transparent Conductive Oxide: AZO provides high transparency in the visible range and good electrical conductivity, making it ideal for optoelectronic devices.
    • Low-Cost Alternative to ITO: AZO is an affordable alternative to indium tin oxide, which is commonly used but more expensive due to the scarcity of indium.
    • Stable in Different Environments: AZO thin films exhibit good chemical and thermal stability, making them suitable for various environmental conditions.
    • High Transmission: AZO films offer high transparency in the visible spectrum, which is critical for applications like displays and solar cells.
    • Tunable Properties: By adjusting the aluminum doping level, the electrical and optical properties of AZO can be tuned for specific applications.
    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • AZO Sputtering Target 3N-6N High Purity ZnO Al2O3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom for VacuumPVD Coating - Tinsan MaterialsAZO Sputtering Target 3N-6N High Purity ZnO Al2O3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom for VacuumPVD Coating - Tinsan Materials

    AZO (Aluminum-Doped Zinc Oxide) Sputtering Target

    • High Optical Transparency: AZO offers excellent transparency in the visible spectrum, making it ideal for applications requiring clear conductive films.
    • Good Electrical Conductivity: Despite its transparency, AZO provides high electrical conductivity, which is critical in photovoltaic cells and touchscreens.
    • Environmentally Friendly: Unlike ITO, AZO does not rely on scarce or expensive elements like indium, making it a more sustainable and cost-effective choice.
    • Thermal and Chemical Stability: AZO films maintain stability under various temperature and environmental conditions, making them suitable for outdoor and industrial applications.
    • Low Reflectivity: AZO films are known for their low reflectance, which is beneficial in display technologies to reduce glare and improve visibility.
  • Boron Pellets Evaporation Material 2N5-6N High Purity B Granules Particles for Coating High Pure 99.5%-99.9999% Customized - Tinsan MaterialsBoron Granules Evaporation Material 2N5-6N High Purity B Pellets Particles for Coating High Pure 99.5%-99.9999% Customized - Tinsan Materials

    B Boron Granules Pellets Evaporation Materials 2N5 – 6N (99.5% – 99.9999%)

    • High Hardness: Boron is extremely hard, making it ideal for applications requiring wear resistance.
    • High Melting Point: Boron has a high melting point of 2,075°C, making it suitable for high-temperature deposition processes.
    • Excellent Chemical Resistance: Boron is chemically inert in many environments, offering durability in corrosive conditions.
    • Neutron Absorption: Boron is capable of absorbing neutrons, making it useful in nuclear shielding applications.
    • Low Density: Boron is lightweight, making it suitable for applications requiring minimal mass, such as aerospace and optics.
  • B Boron Powder 2N-6N High Purity B Nanopowder Nano Boron Powder Nanoparticles High Pure 99%-99.9999% Customized - Tinsan Materials

    B Boron Powder 6N (99.9999%)

    • High Melting Point: Boron has a melting point of 2,076°C, making it suitable for high-temperature applications.
    • Low Density: It is lightweight compared to many metals, which makes it advantageous for use in lightweight materials and alloys.
    • Hardness: Boron is extremely hard and is a key component in creating super-hard materials like boron carbide.
    • Neutron Absorption: Boron’s ability to absorb neutrons without forming long-lived radioactive isotopes makes it vital for radiation shielding and nuclear control rods.
    • High Thermal Conductivity: It efficiently conducts heat, which is beneficial for thermal management in electronics and other high-temperature systems.
  • Boron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target CustomizedBoron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target Customized

    B Boron Sputtering Target

    Boron (B) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to deposit thin films of boron onto various substrates. These targets are widely used in industries such as electronics, optics, and materials science due to boron’s unique properties.

  • B2O3 Pellets Evaporation Materials 3N-6N High Purity Boron Trioxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    B2O3 (Boron Trioxide) Pellets Granules Evaporation Materials

    • High Purity: Ensures optimal performance in sensitive applications.
    • Thermal Stability: Maintains integrity under high-temperature conditions.
    • Optical Transparency: Ideal for optical and electronic coatings.
    • Versatile Uses: Applicable across industries including electronics, optics, and materials science.
    • Customizable Sizes: Available in various pellet sizes to meet specific requirements.
  • B2O3 Powder 3N-5N High Purity Boron Trioxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    B2O3 (Boron Trioxide) Powder

    • High Purity: Available with ≥99.9% purity for consistent performance.
    • Excellent Glass-Forming Properties: A key ingredient in borosilicate glass and optical fibers.
    • Thermal Stability: Withstands high temperatures without decomposition.
    • Chemical Inertness: Resistant to most chemicals, making it ideal for specialized applications.
    • Customizable Particle Sizes: Nano (<100 nm) and micro (1–50 µm) options available or customized.
    • Eco-Friendly: Non-toxic and compliant with environmental standards.
  • B4C Powder 2N5-6N High Purity Boron Carbide Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.9999% Customized - Tinsan Materials

    B4C (Boron Carbide) Powder

    • Extreme Hardness: Mohs hardness of 9.5, second only to diamond and cubic boron nitride.
    • Low Density: Lightweight material ideal for aerospace and defense applications.
    • High Thermal Stability: Exceptional performance at high temperatures.
    • Chemical Inertness: Resistant to most acids and alkalis.
    • Superior Wear Resistance: Ideal for abrasive and protective applications.
    • Customizable Particle Sizes: Nano (<100 nm) and micro (1–50 µm) grades available or customized.
  • B4C Sputtering Targets 2N-6N High Purity Boron Carbide Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsBoron Carbide Sputtering Targets 2N-6N High Purity B4C Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    B4C (Boron Carbide) Sputtering Targets

    • Exceptional Hardness: High resistance to wear and abrasion.
    • Chemical Stability: Resistant to acids and alkalis, ensuring longevity in extreme environments.
    • Lightweight: Facilitates applications where low weight is critical.
    • High Purity: Delivers superior film quality and consistency.