Showing 49–60 of 525 results

  • Boron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target CustomizedBoron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target Customized

    B Boron Sputtering Target

    Boron (B) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to deposit thin films of boron onto various substrates. These targets are widely used in industries such as electronics, optics, and materials science due to boron’s unique properties.

  • B2O3 Pellets Evaporation Materials 3N-6N High Purity Boron Trioxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    B2O3 (Boron Trioxide) Pellets Granules Evaporation Materials

    • High Purity: Ensures optimal performance in sensitive applications.
    • Thermal Stability: Maintains integrity under high-temperature conditions.
    • Optical Transparency: Ideal for optical and electronic coatings.
    • Versatile Uses: Applicable across industries including electronics, optics, and materials science.
    • Customizable Sizes: Available in various pellet sizes to meet specific requirements.
  • B2O3 Powder 3N-5N High Purity Boron Trioxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    B2O3 (Boron Trioxide) Powder

    • High Purity: Available with ≥99.9% purity for consistent performance.
    • Excellent Glass-Forming Properties: A key ingredient in borosilicate glass and optical fibers.
    • Thermal Stability: Withstands high temperatures without decomposition.
    • Chemical Inertness: Resistant to most chemicals, making it ideal for specialized applications.
    • Customizable Particle Sizes: Nano (<100 nm) and micro (1–50 µm) options available or customized.
    • Eco-Friendly: Non-toxic and compliant with environmental standards.
  • B4C Powder 2N5-6N High Purity Boron Carbide Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.9999% Customized - Tinsan Materials

    B4C (Boron Carbide) Powder

    • Extreme Hardness: Mohs hardness of 9.5, second only to diamond and cubic boron nitride.
    • Low Density: Lightweight material ideal for aerospace and defense applications.
    • High Thermal Stability: Exceptional performance at high temperatures.
    • Chemical Inertness: Resistant to most acids and alkalis.
    • Superior Wear Resistance: Ideal for abrasive and protective applications.
    • Customizable Particle Sizes: Nano (<100 nm) and micro (1–50 µm) grades available or customized.
  • B4C Sputtering Targets 2N-6N High Purity Boron Carbide Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsBoron Carbide Sputtering Targets 2N-6N High Purity B4C Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    B4C (Boron Carbide) Sputtering Targets

    • Exceptional Hardness: High resistance to wear and abrasion.
    • Chemical Stability: Resistant to acids and alkalis, ensuring longevity in extreme environments.
    • Lightweight: Facilitates applications where low weight is critical.
    • High Purity: Delivers superior film quality and consistency.
  • Barium Sputtering Target, 99.9% High Purity Ba Sputtering Target Customized

    Ba Barium Sputtering Target

    Barium (Ba) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films on various substrates. Barium targets are typically used in the production of optical coatings, semiconductor devices, and other advanced materials due to their unique properties.

  • BaTiO3 Pellets Evaporation Materials 3N-6N High Purity Barium Titanate Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BaTiO3 (Barium Titanate / Barium Titanium Oxide) Pellets Granules Evaporation Materials

    • High purity (≥99.99%).
    • Outstanding dielectric and ferroelectric properties.
    • Suitable for thin-film deposition techniques such as PVD.
    • Uniform pellet size for consistent results in industrial and research settings.
    • Custom sizes and packaging available.
  • BaTiO3 Sputtering Target 3N-7N High Purity Barium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    BaTiO3 (Barium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: BaTiO₃ is known for its exceptionally high dielectric constant, making it ideal for capacitors and electro-optic applications.
    • Ferroelectric and Piezoelectric Properties: The material exhibits both ferroelectric and piezoelectric behaviors, making it suitable for memory devices, sensors, and actuators.
    • Excellent Thermal Stability: BaTiO₃ maintains good thermal stability, ensuring reliable performance in high-temperature environments.
    • High Purity and Low Defects: BaTiO₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, which is crucial for advanced electronic applications.
    • Custom Composition: Barium Titanate can be tailored with dopants to modify its electrical and thermal properties, optimizing performance for specific applications.
  • Bismuth Pellets Evaporation Material 4N-7N High Purity Metal Bi Granules Particles for Coating High Pure 99.99%-99.99999% Customized - Tinsan MaterialsBismuth Pellets Evaporation Material 4N-7N High Purity Metal Bi Granules Particles for Coating High Pure 99.99%-99.99999% Customize - Tinsan Materials.jpg

    Bi Bismuth Pellets Granules Evaporation Materials

    • Low Toxicity: Bismuth is one of the few heavy metals considered relatively non-toxic, making it a safer alternative for certain applications.
    • Unique Electrical Properties: Bismuth exhibits interesting electronic properties, such as a high Hall coefficient and low thermal conductivity, beneficial for thermoelectric applications.
    • High Density: Bismuth’s high atomic mass and density make it suitable for applications requiring heavy elements.
    • Low Melting Point: With a melting point of 271.4°C, bismuth is relatively easy to evaporate, allowing for low-temperature thin-film deposition.
    • Optical Characteristics: Bismuth coatings can manipulate light in specific wavelengths, contributing to its use in optical and IR coatings.
  • Bi Bismuth Powder 3N-7N High Purity Bi Nanopowder Nano Powder Bismuth Nanoparticles High Pure 99.9%-99.99999% Customize - Tinsan Materials

    Bi Bismuth Powder 7N (99.99999%)

    • High Purity: Ensures superior performance in specialized applications.
    • Non-Toxic and Eco-Friendly: A safe alternative to lead in many applications.
    • Low Melting Point: Ideal for use in low-temperature solders and alloys.
    • High Density: Suitable for counterweights, radiation shielding, and industrial applications.
    • Excellent Machinability: Easy to shape and process for intricate designs.
    • Corrosion Resistance: Offers stability in various environmental conditions.
  • Bismuth Sputtering Target, 99.99%-99.999% High Purity Bi Metal Sputtering Target CustomizedBismuth Sputtering Target, 99.99%-99.999% High Purity Bi Metal Sputtering Target Customized

    Bi Bismuth Sputtering Target

    Bismuth (Bi) is a unique metal known for its low toxicity, high density, and distinct electronic properties, making it valuable in specific electronic, optical, and magnetic applications. Bismuth (Bi) sputtering targets are essential for industries requiring specialized thin films with unique electronic, optical, and magnetic properties, particularly in advanced electronics, superconductors, and optical devices.

  • Bi2O2Se Sputtering Targets 2N5-6N High Purity Bismuth Oxyselenide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Bi2O2Se (Bismuth Oxyselenide) Sputtering Targets

    • Layered Structure: Enables the exfoliation of thin films for various nanodevice applications.
    • High Carrier Mobility: Supports rapid electron and hole movement for faster electronic response.
    • Tunable Bandgap: Adjustable for different applications, optimizing its use in various electronic and optical devices.
    • Good Thermal Stability: Suitable for high-temperature applications, enhancing long-term reliability.